Liquid‐Phase Quasi‐Epitaxial Growth of Highly Stable, Monolithic UiO‐66‐NH(2) MOF thin Films on Solid Substrates

High quality, monolithic UiO‐66‐NH(2) thin films on diverse solid substrates have been prepared via a low temperature liquid phase epitaxy method. The achievement of continuous films with low defect densities and great stability against high temperatures and hot water is proven, clearly outperformin...

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Detalles Bibliográficos
Autores principales: Hashem, Tawheed, Valadez Sánchez, Elvia P., Weidler, Peter G., Gliemann, Hartmut, Alkordi, Mohamed H., Wöll, Christof
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2020
Materias:
Communications
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7197087/
https://www.ncbi.nlm.nih.gov/pubmed/32373421
http://dx.doi.org/10.1002/open.201900324
Descripción
Sumario:High quality, monolithic UiO‐66‐NH(2) thin films on diverse solid substrates have been prepared via a low temperature liquid phase epitaxy method. The achievement of continuous films with low defect densities and great stability against high temperatures and hot water is proven, clearly outperforming other reported types of MOF thin films.

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