Software development for modeling irregular fine protrusions formed by sputter etching

Irregular fine protrusions formed on the surface of a mechanical part through biomimetic technology can enhance the part’s properties, including tribology, self-cleaning, and light absorption. However, underlying principles for the formation of fine protrusions according to the requirements of their...

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Detalles Bibliográficos
Autores principales: Gao, Sande, Nakasa, Keijiro, Huang, Loulin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer Singapore 2020
Materias:
Original Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7203329/
https://www.ncbi.nlm.nih.gov/pubmed/32377880
http://dx.doi.org/10.1186/s42492-020-00047-9
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author Gao, Sande
Nakasa, Keijiro
Huang, Loulin
author_facet Gao, Sande
Nakasa, Keijiro
Huang, Loulin
author_sort Gao, Sande
collection PubMed
description Irregular fine protrusions formed on the surface of a mechanical part through biomimetic technology can enhance the part’s properties, including tribology, self-cleaning, and light absorption. However, underlying principles for the formation of fine protrusions according to the requirements of their shapes, sizes, and material distributions have not been studied sufficiently. This paper presents the software development for modeling irregular fine protrusions, which is essential for the simulation, experimentation, and analysis of fine protrusions formed by sputter etching.
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spelling pubmed-72033292020-05-12 Software development for modeling irregular fine protrusions formed by sputter etching Gao, Sande Nakasa, Keijiro Huang, Loulin Vis Comput Ind Biomed Art Original Article Irregular fine protrusions formed on the surface of a mechanical part through biomimetic technology can enhance the part’s properties, including tribology, self-cleaning, and light absorption. However, underlying principles for the formation of fine protrusions according to the requirements of their shapes, sizes, and material distributions have not been studied sufficiently. This paper presents the software development for modeling irregular fine protrusions, which is essential for the simulation, experimentation, and analysis of fine protrusions formed by sputter etching. Springer Singapore 2020-05-07 /pmc/articles/PMC7203329/ /pubmed/32377880 http://dx.doi.org/10.1186/s42492-020-00047-9 Text en © The Author(s) 2020 Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Original Article
Gao, Sande
Nakasa, Keijiro
Huang, Loulin
Software development for modeling irregular fine protrusions formed by sputter etching
title Software development for modeling irregular fine protrusions formed by sputter etching
title_full Software development for modeling irregular fine protrusions formed by sputter etching
title_fullStr Software development for modeling irregular fine protrusions formed by sputter etching
title_full_unstemmed Software development for modeling irregular fine protrusions formed by sputter etching
title_short Software development for modeling irregular fine protrusions formed by sputter etching
title_sort software development for modeling irregular fine protrusions formed by sputter etching
topic Original Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7203329/
https://www.ncbi.nlm.nih.gov/pubmed/32377880
http://dx.doi.org/10.1186/s42492-020-00047-9
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