Variation on the Microstructure and Mechanical Properties of Ti-Al-N Films Induced by RF-ICP Ion Source Enhanced Reactive Nitrogen Plasma Atmosphere

Acquiring the optimum growth conditions of Ti-Al-N films, the effects of gas atmosphere, especially the reactive plasma on the material microstructures, and mechanical properties are still a fundamental and important issue. In this study, Ti-Al-N films are reactively deposited by radio frequency ind...

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Detalles Bibliográficos
Autores principales: Li, Dongke, Xia, Lixia, Yan, Lian, Cao, Yunqing, Zhai, Zhangyin, Chen, Guibin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2020
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7246271/
https://www.ncbi.nlm.nih.gov/pubmed/32449078
http://dx.doi.org/10.1186/s11671-020-03354-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7246271/
https://www.ncbi.nlm.nih.gov/pubmed/32449078
http://dx.doi.org/10.1186/s11671-020-03354-5

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