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Low temperature SiC die-attach bonding technology by hillocks generation on Al sheet surface with stress self-generation and self-release

This paper introduced an approach of die-attach bonding technology based on a low-cost high-purity aluminum (99.99%) sheet in a silicon carbide (SiC)/direct bonded aluminum (DBA) power module. Both sides of an Al sheet were sputtered by a thin Ti and Ag layer, which generated a tensile stress of 166...

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Autores principales: Chen, Chuantong, Suganuma, Katsuaki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7270210/
https://www.ncbi.nlm.nih.gov/pubmed/32494058
http://dx.doi.org/10.1038/s41598-020-66069-8
_version_ 1783541874379718656
author Chen, Chuantong
Suganuma, Katsuaki
author_facet Chen, Chuantong
Suganuma, Katsuaki
author_sort Chen, Chuantong
collection PubMed
description This paper introduced an approach of die-attach bonding technology based on a low-cost high-purity aluminum (99.99%) sheet in a silicon carbide (SiC)/direct bonded aluminum (DBA) power module. Both sides of an Al sheet were sputtered by a thin Ti and Ag layer, which generated a tensile stress of 166 MPa on the Al surface. After heating, the Al surface displayed a large quantity of Ag hillocks by stress self-release due to the coefficient of thermal expansion (CTE) mismatch among Al, Ti, and Ag. The SiC/Al sheet/DBA substrate interfaces were bridged by the generation of these hillocks, which correspond to a robust shear strength of 33.4 MPa in a low-temperature process. Hillocks generation and the interface bonding mechanism by surface stress self-generation and self-release were systematically analyzed by scanning electron microscopy (SEM), X-ray diffraction (XRD), and transmission electron microscopy (TEM). The shear strength remains constant at 32.1 MPa after high-temperature storage at 250 °C for 500 h, which suggests that the Al sheet possesses excellent high-heat resistance and thermal stability. This novel approach of die-attach bonding technology serves as an attractive alternative for SiC power devices that require high-temperature performance.
format Online
Article
Text
id pubmed-7270210
institution National Center for Biotechnology Information
language English
publishDate 2020
publisher Nature Publishing Group UK
record_format MEDLINE/PubMed
spelling pubmed-72702102020-06-05 Low temperature SiC die-attach bonding technology by hillocks generation on Al sheet surface with stress self-generation and self-release Chen, Chuantong Suganuma, Katsuaki Sci Rep Article This paper introduced an approach of die-attach bonding technology based on a low-cost high-purity aluminum (99.99%) sheet in a silicon carbide (SiC)/direct bonded aluminum (DBA) power module. Both sides of an Al sheet were sputtered by a thin Ti and Ag layer, which generated a tensile stress of 166 MPa on the Al surface. After heating, the Al surface displayed a large quantity of Ag hillocks by stress self-release due to the coefficient of thermal expansion (CTE) mismatch among Al, Ti, and Ag. The SiC/Al sheet/DBA substrate interfaces were bridged by the generation of these hillocks, which correspond to a robust shear strength of 33.4 MPa in a low-temperature process. Hillocks generation and the interface bonding mechanism by surface stress self-generation and self-release were systematically analyzed by scanning electron microscopy (SEM), X-ray diffraction (XRD), and transmission electron microscopy (TEM). The shear strength remains constant at 32.1 MPa after high-temperature storage at 250 °C for 500 h, which suggests that the Al sheet possesses excellent high-heat resistance and thermal stability. This novel approach of die-attach bonding technology serves as an attractive alternative for SiC power devices that require high-temperature performance. Nature Publishing Group UK 2020-06-03 /pmc/articles/PMC7270210/ /pubmed/32494058 http://dx.doi.org/10.1038/s41598-020-66069-8 Text en © The Author(s) 2020 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Chen, Chuantong
Suganuma, Katsuaki
Low temperature SiC die-attach bonding technology by hillocks generation on Al sheet surface with stress self-generation and self-release
title Low temperature SiC die-attach bonding technology by hillocks generation on Al sheet surface with stress self-generation and self-release
title_full Low temperature SiC die-attach bonding technology by hillocks generation on Al sheet surface with stress self-generation and self-release
title_fullStr Low temperature SiC die-attach bonding technology by hillocks generation on Al sheet surface with stress self-generation and self-release
title_full_unstemmed Low temperature SiC die-attach bonding technology by hillocks generation on Al sheet surface with stress self-generation and self-release
title_short Low temperature SiC die-attach bonding technology by hillocks generation on Al sheet surface with stress self-generation and self-release
title_sort low temperature sic die-attach bonding technology by hillocks generation on al sheet surface with stress self-generation and self-release
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7270210/
https://www.ncbi.nlm.nih.gov/pubmed/32494058
http://dx.doi.org/10.1038/s41598-020-66069-8
work_keys_str_mv AT chenchuantong lowtemperaturesicdieattachbondingtechnologybyhillocksgenerationonalsheetsurfacewithstressselfgenerationandselfrelease
AT suganumakatsuaki lowtemperaturesicdieattachbondingtechnologybyhillocksgenerationonalsheetsurfacewithstressselfgenerationandselfrelease