Atomic Layer Deposition of ZnO on Mesoporous Silica: Insights into Growth Behavior of ZnO via In-Situ Thermogravimetric Analysis

ZnO is a remarkable material with many applications in electronics and catalysis. Atomic layer deposition (ALD) of ZnO on flat substrates is an industrially applied and well-known process. Various studies describe the growth of ZnO layers on flat substrates. However, the growth characteristics and r...

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Detalles Bibliográficos
Autores principales: Ingale, Piyush, Knemeyer, Kristian, Piernavieja Hermida, Mar, Naumann d’Alnoncourt, Raoul, Thomas, Arne, Rosowski, Frank
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7279530/
https://www.ncbi.nlm.nih.gov/pubmed/32443853
http://dx.doi.org/10.3390/nano10050981

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7279530/
https://www.ncbi.nlm.nih.gov/pubmed/32443853
http://dx.doi.org/10.3390/nano10050981

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