Improvement of Etching Anisotropy in Fused Silica by Double-Pulse Fabrication

Femtosecond laser-induced selective etching (FLISE) is a promising technology for fabrication of a wide range of optical, mechanical and microfluidic devices. Various etching conditions, together with significant process optimisations, have already been demonstrated. However, the FLISE technology st...

Descripción completa

Detalles Bibliográficos
Autores principales: Stankevič, Valdemar, Karosas, Jonas, Račiukaitis, Gediminas, Gečys, Paulius
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7281658/
https://www.ncbi.nlm.nih.gov/pubmed/32397123
http://dx.doi.org/10.3390/mi11050483

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7281658/
https://www.ncbi.nlm.nih.gov/pubmed/32397123
http://dx.doi.org/10.3390/mi11050483

Ejemplares similares