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Improvement of Etching Anisotropy in Fused Silica by Double-Pulse Fabrication
Femtosecond laser-induced selective etching (FLISE) is a promising technology for fabrication of a wide range of optical, mechanical and microfluidic devices. Various etching conditions, together with significant process optimisations, have already been demonstrated. However, the FLISE technology st...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7281658/ https://www.ncbi.nlm.nih.gov/pubmed/32397123 http://dx.doi.org/10.3390/mi11050483 |