3D Micro/Nanopatterning of a Vinylferrocene Copolymer

In nanoimprint lithography (NIL), a pattern is created by mechanical deformation of an imprint resist via embossing with a stamp, where the adhesion behavior during the filling of the imprint stamp and its subsequent detachment may impose some practical challenges. Here we explored thermal and rever...

Descripción completa

Detalles Bibliográficos
Autores principales: Löber, Dennis, Dey, Subhayan, Kaban, Burhan, Roesler, Fabian, Maurer, Martin, Hillmer, Hartmut, Pietschnig, Rudolf
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7287958/
https://www.ncbi.nlm.nih.gov/pubmed/32456151
http://dx.doi.org/10.3390/molecules25102438

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7287958/
https://www.ncbi.nlm.nih.gov/pubmed/32456151
http://dx.doi.org/10.3390/molecules25102438

Ejemplares similares