Cargando…

Cell Culture on Low-Fluorescence and High-Resolution Photoresist

2D and 3D topographic cues made of photoresist, a polymer, are used for cell culture and cell analysis. Photoresists used for cell analysis provide the surface conditions necessary for proper cell growth, along with patterning properties of a wide range and high precision, and low auto-fluorescence...

Descripción completa

Detalles Bibliográficos
Autores principales:	Ueno, Hidetaka, Maruo, Katsuya, Inoue, Masatoshi, Kotera, Hidetoshi, Suzuki, Takaaki
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2020
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7345055/ https://www.ncbi.nlm.nih.gov/pubmed/32512915 http://dx.doi.org/10.3390/mi11060571

Ejemplares similares

Micropatterning Method for Porous Materials Using the Difference of the Glass Transition Temperature between Exposed and Unexposed Areas of a Thick-Photoresist
por: Ueno, Hidetaka, et al.
Publicado: (2019)

Negative-tone molecular glass photoresist for high-resolution electron beam lithography
por: Wang, Yafei, et al.
Publicado: (2021)

Photoresistance Switching of Plasmonic Nanopores
por: Li, Yi, et al.
Publicado: (2014)

Review of recent advances in inorganic photoresists
por: Luo, Chaoyun, et al.
Publicado: (2020)

MoS(2) memristor with photoresistive switching
por: Wang, Wei, et al.
Publicado: (2016)

Epoxy Resins for Negative Tone Photoresists
por: Vlnieska, Vitor, et al.
Publicado: (2019)

Photoresist Derived Carbon for Growth and Differentiation of Neuronal Cells
por: Zhou, Hong, et al.
Publicado: (2007)

Integration Method of Microchannel and Vertical Micromesh Structure for Three-Dimensional Cell Culture Using Inclined Exposure and Inclined Oxygen Ashing
por: Ueno, Hidetaka, et al.
Publicado: (2018)

Novel hexameric tin carboxylate clusters as efficient negative-tone EUV photoresists: high resolution with well-defined patterns under low energy doses
por: Wu, Jia-Rong, et al.
Publicado: (2023)

Corrigendum: MoS(2) memristor with photoresistive switching
por: Wang, Wei, et al.
Publicado: (2016)

Method for the Characterization of Extreme-Ultraviolet Photoresist Outgassing
por: Tarrio, Charles
Publicado: (2009)

Volume Hologram Formation in SU-8 Photoresist
por: Sabel, Tina
Publicado: (2017)

Fabrication of Multilayer Molds by Dry Film Photoresist
por: Koucherian, Narek E., et al.
Publicado: (2022)

Photoresist Design for Elastomeric Light Tunable Photonic Devices
por: Nocentini, Sara, et al.
Publicado: (2016)

Optimized plasma-assisted bi-layer photoresist fabrication protocol for high resolution microfabrication of thin-film metal electrodes on porous polymer membranes
por: Schuller, Patrick, et al.
Publicado: (2019)

The nanostructuring of surfaces and films using interference lithography and chalcogenide photoresist
por: Dan’ko, Viktor, et al.
Publicado: (2015)

Invisible Security Printing on Photoresist Polymer Readable by Terahertz Spectroscopy
por: Shin, Hee Jun, et al.
Publicado: (2017)

Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
por: Horváth, Bence, et al.
Publicado: (2017)

Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
por: Rohdenburg, Markus, et al.
Publicado: (2021)

Fabrication of Periodic Plasmonic Structures Using Interference Lithography and Chalcogenide Photoresist
por: Dan’ko, Viktor, et al.
Publicado: (2015)

Beyond EUV lithography: a comparative study of efficient photoresists' performance
por: Mojarad, Nassir, et al.
Publicado: (2015)

Comprehensive Simulations for Ultraviolet Lithography Process of Thick SU-8 Photoresist
por: Zhou, Zai-Fa, et al.
Publicado: (2018)

Surface Wettability Tuning of Acrylic Resin Photoresist and Its Aging Performance
por: Dou, Yingying, et al.
Publicado: (2021)

Helicity dependent photoresistance measurement vs. beam-shift thermal gradient
por: Yang, Haozhe, et al.
Publicado: (2022)

Physical Transient Photoresistive Variable Memory Based on Graphene Quantum Dots
por: Wang, Lu, et al.
Publicado: (2022)

Anti-adsorption Mechanism of Photoresist by Pluronic Surfactants: An Insight into Their Adsorbed Structure
por: Hanzawa, Masaki, et al.
Publicado: (2023)

In Situ Subcellular Detachment of Cells Using a Cell‐Friendly Photoresist and Spatially Modulated Light
por: Park, Jeehun, et al.
Publicado: (2019)

Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography
por: Vlnieska, Vitor, et al.
Publicado: (2020)

Single-Cell Microarray Chip with Inverse-Tapered Wells to Maintain High Ratio of Cell Trapping
por: Sano, Ryota, et al.
Publicado: (2023)

Microwave-Assisted Syntheses in Recyclable Ionic Liquids: Photoresists Based on Renewable Resources
por: Petit, Charlotte, et al.
Publicado: (2015)

Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
por: Wolfberger, Archim, et al.
Publicado: (2014)

Measuring Liquid Drop Properties on Nanoscale 1D Patterned Photoresist Structures
por: Faria-Briceno, Juan J., et al.
Publicado: (2019)

Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants
por: Hanzawa, Masaki, et al.
Publicado: (2023)

A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist
por: Geng, Zi-Chen, et al.
Publicado: (2020)

Surface improvement of organic photoresists using a near-field-dependent etching method
por: Brandenburg, Felix J, et al.
Publicado: (2017)

Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope
por: Roszkiewicz, Agata, et al.
Publicado: (2019)

A comprehensive nano-interpenetrating semiconducting photoresist toward all-photolithography organic electronics
por: Chen, Renzhong, et al.
Publicado: (2021)

Hierarchically Porous, Laser-Pyrolyzed Carbon Electrode from Black Photoresist for On-Chip Microsupercapacitors
por: Kwon, Soongeun, et al.
Publicado: (2021)

Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance
por: Thakur, Neha, et al.
Publicado: (2022)

New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
por: Liu, Junjun, et al.
Publicado: (2023)

Cannot write session to /tmp/vufind_sessions/sess_7fcq2tr1lcipcl31nfu54d33fn