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Resistance Reduction of Conductive Patterns Printed on Textile by Curing Shrinkage of Passivation Layers
Directly printing conductive ink on textiles is simple and compatible with the conventional electronics manufacturing process. However, the conductive patterns thus formed often show high initial resistance and significant resistance increase due to tensile deformation. Achieving conductive patterns...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7346002/ https://www.ncbi.nlm.nih.gov/pubmed/32466466 http://dx.doi.org/10.3390/mi11060539 |
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author | Koshi, Tomoya Nomura, Ken-ichi Yoshida, Manabu |
author_facet | Koshi, Tomoya Nomura, Ken-ichi Yoshida, Manabu |
author_sort | Koshi, Tomoya |
collection | PubMed |
description | Directly printing conductive ink on textiles is simple and compatible with the conventional electronics manufacturing process. However, the conductive patterns thus formed often show high initial resistance and significant resistance increase due to tensile deformation. Achieving conductive patterns with low initial resistance and reduced deformation-induced resistance increase is a significant challenge in the field of electronic textiles (e-textiles). In this study, the passivation layers printed on conductive patterns, which are necessary for practical use, were examined as a possible solution. Specifically, the reduction of the initial resistance and deformation-induced resistance increase, caused by the curing shrinkage of passivation layers, were theoretically and experimentally investigated. In the theoretical analysis, to clarify the mechanism of the reduction of deformation-induced resistance increase, crack propagation in conductive patterns was analyzed. In the experiments, conductive patterns with and without shrinking passivation layers (polydimethylsiloxane) cured at temperatures of 20–120 °C were prepared, and the initial resistances and resistance increases due to cyclic tensile and washing in each case were compared. As a result, the initial resistance was reduced further by the formation of shrinking passivation layers cured at higher temperatures, and reduced to 0.45 times when the curing temperature was 120 °C. The cyclic tensile and washing tests confirmed a 0.48 and a 0.011 times reduction of resistance change rate after the 100th elongation cycle (10% in elongation rate) and the 10th washing cycle, respectively, by comparing the samples with and without shrinking passivation layers cured at 120 °C. |
format | Online Article Text |
id | pubmed-7346002 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-73460022020-07-14 Resistance Reduction of Conductive Patterns Printed on Textile by Curing Shrinkage of Passivation Layers Koshi, Tomoya Nomura, Ken-ichi Yoshida, Manabu Micromachines (Basel) Article Directly printing conductive ink on textiles is simple and compatible with the conventional electronics manufacturing process. However, the conductive patterns thus formed often show high initial resistance and significant resistance increase due to tensile deformation. Achieving conductive patterns with low initial resistance and reduced deformation-induced resistance increase is a significant challenge in the field of electronic textiles (e-textiles). In this study, the passivation layers printed on conductive patterns, which are necessary for practical use, were examined as a possible solution. Specifically, the reduction of the initial resistance and deformation-induced resistance increase, caused by the curing shrinkage of passivation layers, were theoretically and experimentally investigated. In the theoretical analysis, to clarify the mechanism of the reduction of deformation-induced resistance increase, crack propagation in conductive patterns was analyzed. In the experiments, conductive patterns with and without shrinking passivation layers (polydimethylsiloxane) cured at temperatures of 20–120 °C were prepared, and the initial resistances and resistance increases due to cyclic tensile and washing in each case were compared. As a result, the initial resistance was reduced further by the formation of shrinking passivation layers cured at higher temperatures, and reduced to 0.45 times when the curing temperature was 120 °C. The cyclic tensile and washing tests confirmed a 0.48 and a 0.011 times reduction of resistance change rate after the 100th elongation cycle (10% in elongation rate) and the 10th washing cycle, respectively, by comparing the samples with and without shrinking passivation layers cured at 120 °C. MDPI 2020-05-26 /pmc/articles/PMC7346002/ /pubmed/32466466 http://dx.doi.org/10.3390/mi11060539 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Koshi, Tomoya Nomura, Ken-ichi Yoshida, Manabu Resistance Reduction of Conductive Patterns Printed on Textile by Curing Shrinkage of Passivation Layers |
title | Resistance Reduction of Conductive Patterns Printed on Textile by Curing Shrinkage of Passivation Layers |
title_full | Resistance Reduction of Conductive Patterns Printed on Textile by Curing Shrinkage of Passivation Layers |
title_fullStr | Resistance Reduction of Conductive Patterns Printed on Textile by Curing Shrinkage of Passivation Layers |
title_full_unstemmed | Resistance Reduction of Conductive Patterns Printed on Textile by Curing Shrinkage of Passivation Layers |
title_short | Resistance Reduction of Conductive Patterns Printed on Textile by Curing Shrinkage of Passivation Layers |
title_sort | resistance reduction of conductive patterns printed on textile by curing shrinkage of passivation layers |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7346002/ https://www.ncbi.nlm.nih.gov/pubmed/32466466 http://dx.doi.org/10.3390/mi11060539 |
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