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Plasma medicine for neuroscience—an introduction
Plasma is an ionized gas. It is typically formed at high temperature. As a result of both the development of low-temperature plasma sources and a better understanding of complex plasma phenomena over the last decade, “plasma medicine” has become a booming interdisciplinary research topic of growing...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
BioMed Central
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7398231/ https://www.ncbi.nlm.nih.gov/pubmed/32922924 http://dx.doi.org/10.1186/s41016-019-0172-9 |
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author | Yan, Xu Ouyang, Jiting Zhang, Chenyang Shi, Zhongfang Wang, Boran Ostrikov, Kostya ( Ken) |
author_facet | Yan, Xu Ouyang, Jiting Zhang, Chenyang Shi, Zhongfang Wang, Boran Ostrikov, Kostya ( Ken) |
author_sort | Yan, Xu |
collection | PubMed |
description | Plasma is an ionized gas. It is typically formed at high temperature. As a result of both the development of low-temperature plasma sources and a better understanding of complex plasma phenomena over the last decade, “plasma medicine” has become a booming interdisciplinary research topic of growing importance that explores enormous opportunities at the interface of chemistry, plasma physics, and biomedical sciences with engineering. This review presents the latest development in plasma medicine in the area of the central nervous system and aims to introduce cutting-edge plasma medicine to clinical and translational medical researchers and practitioners. |
format | Online Article Text |
id | pubmed-7398231 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | BioMed Central |
record_format | MEDLINE/PubMed |
spelling | pubmed-73982312020-09-10 Plasma medicine for neuroscience—an introduction Yan, Xu Ouyang, Jiting Zhang, Chenyang Shi, Zhongfang Wang, Boran Ostrikov, Kostya ( Ken) Chin Neurosurg J Review Plasma is an ionized gas. It is typically formed at high temperature. As a result of both the development of low-temperature plasma sources and a better understanding of complex plasma phenomena over the last decade, “plasma medicine” has become a booming interdisciplinary research topic of growing importance that explores enormous opportunities at the interface of chemistry, plasma physics, and biomedical sciences with engineering. This review presents the latest development in plasma medicine in the area of the central nervous system and aims to introduce cutting-edge plasma medicine to clinical and translational medical researchers and practitioners. BioMed Central 2019-10-19 /pmc/articles/PMC7398231/ /pubmed/32922924 http://dx.doi.org/10.1186/s41016-019-0172-9 Text en © The Author(s) 2019 Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The Creative Commons Public Domain Dedication waiver (http://creativecommons.org/publicdomain/zero/1.0/) applies to the data made available in this article, unless otherwise stated. |
spellingShingle | Review Yan, Xu Ouyang, Jiting Zhang, Chenyang Shi, Zhongfang Wang, Boran Ostrikov, Kostya ( Ken) Plasma medicine for neuroscience—an introduction |
title | Plasma medicine for neuroscience—an introduction |
title_full | Plasma medicine for neuroscience—an introduction |
title_fullStr | Plasma medicine for neuroscience—an introduction |
title_full_unstemmed | Plasma medicine for neuroscience—an introduction |
title_short | Plasma medicine for neuroscience—an introduction |
title_sort | plasma medicine for neuroscience—an introduction |
topic | Review |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7398231/ https://www.ncbi.nlm.nih.gov/pubmed/32922924 http://dx.doi.org/10.1186/s41016-019-0172-9 |
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