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Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications

The ability to change the secondary electron emission properties of nitrogen-doped graphene (N-graphene) has been demonstrated. To this end, a novel microwave plasma-enabled scalable route for continuous and controllable fabrication of free-standing N-graphene sheets was developed. High-quality N-gr...

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Autores principales: Bundaleska, N., Dias, A., Bundaleski, N., Felizardo, E., Henriques, J., Tsyganov, D., Abrashev, M., Valcheva, E., Kissovski, J., Ferraria, A. M., do Rego, A. M. Botelho, Almeida, A., Zavašnik, J., Cvelbar, U., Teodoro, O. M. N. D., Strunskus, Th., Tatarova, E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7398926/
https://www.ncbi.nlm.nih.gov/pubmed/32747630
http://dx.doi.org/10.1038/s41598-020-69844-9
_version_ 1783566043685322752
author Bundaleska, N.
Dias, A.
Bundaleski, N.
Felizardo, E.
Henriques, J.
Tsyganov, D.
Abrashev, M.
Valcheva, E.
Kissovski, J.
Ferraria, A. M.
do Rego, A. M. Botelho
Almeida, A.
Zavašnik, J.
Cvelbar, U.
Teodoro, O. M. N. D.
Strunskus, Th.
Tatarova, E.
author_facet Bundaleska, N.
Dias, A.
Bundaleski, N.
Felizardo, E.
Henriques, J.
Tsyganov, D.
Abrashev, M.
Valcheva, E.
Kissovski, J.
Ferraria, A. M.
do Rego, A. M. Botelho
Almeida, A.
Zavašnik, J.
Cvelbar, U.
Teodoro, O. M. N. D.
Strunskus, Th.
Tatarova, E.
author_sort Bundaleska, N.
collection PubMed
description The ability to change the secondary electron emission properties of nitrogen-doped graphene (N-graphene) has been demonstrated. To this end, a novel microwave plasma-enabled scalable route for continuous and controllable fabrication of free-standing N-graphene sheets was developed. High-quality N-graphene with prescribed structural qualities was produced at a rate of 0.5 mg/min by tailoring the high energy density plasma environment. Up to 8% of nitrogen doping levels were achieved while keeping the oxygen content at residual amounts (~ 1%). The synthesis is accomplished via a single step, at atmospheric conditions, using ethanol/methane and ammonia/methylamine as carbon and nitrogen precursors. The type and level of doping is affected by the position where the N-precursor is injected in the plasma environment and by the type of precursors used. Importantly, N atoms incorporated predominantly in pyridinic/pyrrolic functional groups alter the performance of the collective electronic oscillations, i.e. plasmons, of graphene. For the first time it has been demonstrated that the synergistic effect between the electronic structure changes and the reduction of graphene π-plasmons caused by N doping, along with the peculiar “crumpled” morphology, leads to sub-unitary (< 1) secondary electron yields. N-graphene can be considered as a prospective low secondary electron emission and plasmonic material.
format Online
Article
Text
id pubmed-7398926
institution National Center for Biotechnology Information
language English
publishDate 2020
publisher Nature Publishing Group UK
record_format MEDLINE/PubMed
spelling pubmed-73989262020-08-04 Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications Bundaleska, N. Dias, A. Bundaleski, N. Felizardo, E. Henriques, J. Tsyganov, D. Abrashev, M. Valcheva, E. Kissovski, J. Ferraria, A. M. do Rego, A. M. Botelho Almeida, A. Zavašnik, J. Cvelbar, U. Teodoro, O. M. N. D. Strunskus, Th. Tatarova, E. Sci Rep Article The ability to change the secondary electron emission properties of nitrogen-doped graphene (N-graphene) has been demonstrated. To this end, a novel microwave plasma-enabled scalable route for continuous and controllable fabrication of free-standing N-graphene sheets was developed. High-quality N-graphene with prescribed structural qualities was produced at a rate of 0.5 mg/min by tailoring the high energy density plasma environment. Up to 8% of nitrogen doping levels were achieved while keeping the oxygen content at residual amounts (~ 1%). The synthesis is accomplished via a single step, at atmospheric conditions, using ethanol/methane and ammonia/methylamine as carbon and nitrogen precursors. The type and level of doping is affected by the position where the N-precursor is injected in the plasma environment and by the type of precursors used. Importantly, N atoms incorporated predominantly in pyridinic/pyrrolic functional groups alter the performance of the collective electronic oscillations, i.e. plasmons, of graphene. For the first time it has been demonstrated that the synergistic effect between the electronic structure changes and the reduction of graphene π-plasmons caused by N doping, along with the peculiar “crumpled” morphology, leads to sub-unitary (< 1) secondary electron yields. N-graphene can be considered as a prospective low secondary electron emission and plasmonic material. Nature Publishing Group UK 2020-08-03 /pmc/articles/PMC7398926/ /pubmed/32747630 http://dx.doi.org/10.1038/s41598-020-69844-9 Text en © The Author(s) 2020 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Bundaleska, N.
Dias, A.
Bundaleski, N.
Felizardo, E.
Henriques, J.
Tsyganov, D.
Abrashev, M.
Valcheva, E.
Kissovski, J.
Ferraria, A. M.
do Rego, A. M. Botelho
Almeida, A.
Zavašnik, J.
Cvelbar, U.
Teodoro, O. M. N. D.
Strunskus, Th.
Tatarova, E.
Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications
title Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications
title_full Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications
title_fullStr Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications
title_full_unstemmed Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications
title_short Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications
title_sort prospects for microwave plasma synthesized n-graphene in secondary electron emission mitigation applications
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7398926/
https://www.ncbi.nlm.nih.gov/pubmed/32747630
http://dx.doi.org/10.1038/s41598-020-69844-9
work_keys_str_mv AT bundaleskan prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT diasa prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT bundaleskin prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT felizardoe prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT henriquesj prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT tsyganovd prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT abrashevm prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT valchevae prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT kissovskij prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT ferrariaam prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT doregoambotelho prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT almeidaa prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT zavasnikj prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT cvelbaru prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT teodoroomnd prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT strunskusth prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications
AT tatarovae prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications