Cargando…
Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications
The ability to change the secondary electron emission properties of nitrogen-doped graphene (N-graphene) has been demonstrated. To this end, a novel microwave plasma-enabled scalable route for continuous and controllable fabrication of free-standing N-graphene sheets was developed. High-quality N-gr...
Autores principales: | , , , , , , , , , , , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2020
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7398926/ https://www.ncbi.nlm.nih.gov/pubmed/32747630 http://dx.doi.org/10.1038/s41598-020-69844-9 |
_version_ | 1783566043685322752 |
---|---|
author | Bundaleska, N. Dias, A. Bundaleski, N. Felizardo, E. Henriques, J. Tsyganov, D. Abrashev, M. Valcheva, E. Kissovski, J. Ferraria, A. M. do Rego, A. M. Botelho Almeida, A. Zavašnik, J. Cvelbar, U. Teodoro, O. M. N. D. Strunskus, Th. Tatarova, E. |
author_facet | Bundaleska, N. Dias, A. Bundaleski, N. Felizardo, E. Henriques, J. Tsyganov, D. Abrashev, M. Valcheva, E. Kissovski, J. Ferraria, A. M. do Rego, A. M. Botelho Almeida, A. Zavašnik, J. Cvelbar, U. Teodoro, O. M. N. D. Strunskus, Th. Tatarova, E. |
author_sort | Bundaleska, N. |
collection | PubMed |
description | The ability to change the secondary electron emission properties of nitrogen-doped graphene (N-graphene) has been demonstrated. To this end, a novel microwave plasma-enabled scalable route for continuous and controllable fabrication of free-standing N-graphene sheets was developed. High-quality N-graphene with prescribed structural qualities was produced at a rate of 0.5 mg/min by tailoring the high energy density plasma environment. Up to 8% of nitrogen doping levels were achieved while keeping the oxygen content at residual amounts (~ 1%). The synthesis is accomplished via a single step, at atmospheric conditions, using ethanol/methane and ammonia/methylamine as carbon and nitrogen precursors. The type and level of doping is affected by the position where the N-precursor is injected in the plasma environment and by the type of precursors used. Importantly, N atoms incorporated predominantly in pyridinic/pyrrolic functional groups alter the performance of the collective electronic oscillations, i.e. plasmons, of graphene. For the first time it has been demonstrated that the synergistic effect between the electronic structure changes and the reduction of graphene π-plasmons caused by N doping, along with the peculiar “crumpled” morphology, leads to sub-unitary (< 1) secondary electron yields. N-graphene can be considered as a prospective low secondary electron emission and plasmonic material. |
format | Online Article Text |
id | pubmed-7398926 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-73989262020-08-04 Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications Bundaleska, N. Dias, A. Bundaleski, N. Felizardo, E. Henriques, J. Tsyganov, D. Abrashev, M. Valcheva, E. Kissovski, J. Ferraria, A. M. do Rego, A. M. Botelho Almeida, A. Zavašnik, J. Cvelbar, U. Teodoro, O. M. N. D. Strunskus, Th. Tatarova, E. Sci Rep Article The ability to change the secondary electron emission properties of nitrogen-doped graphene (N-graphene) has been demonstrated. To this end, a novel microwave plasma-enabled scalable route for continuous and controllable fabrication of free-standing N-graphene sheets was developed. High-quality N-graphene with prescribed structural qualities was produced at a rate of 0.5 mg/min by tailoring the high energy density plasma environment. Up to 8% of nitrogen doping levels were achieved while keeping the oxygen content at residual amounts (~ 1%). The synthesis is accomplished via a single step, at atmospheric conditions, using ethanol/methane and ammonia/methylamine as carbon and nitrogen precursors. The type and level of doping is affected by the position where the N-precursor is injected in the plasma environment and by the type of precursors used. Importantly, N atoms incorporated predominantly in pyridinic/pyrrolic functional groups alter the performance of the collective electronic oscillations, i.e. plasmons, of graphene. For the first time it has been demonstrated that the synergistic effect between the electronic structure changes and the reduction of graphene π-plasmons caused by N doping, along with the peculiar “crumpled” morphology, leads to sub-unitary (< 1) secondary electron yields. N-graphene can be considered as a prospective low secondary electron emission and plasmonic material. Nature Publishing Group UK 2020-08-03 /pmc/articles/PMC7398926/ /pubmed/32747630 http://dx.doi.org/10.1038/s41598-020-69844-9 Text en © The Author(s) 2020 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Bundaleska, N. Dias, A. Bundaleski, N. Felizardo, E. Henriques, J. Tsyganov, D. Abrashev, M. Valcheva, E. Kissovski, J. Ferraria, A. M. do Rego, A. M. Botelho Almeida, A. Zavašnik, J. Cvelbar, U. Teodoro, O. M. N. D. Strunskus, Th. Tatarova, E. Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications |
title | Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications |
title_full | Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications |
title_fullStr | Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications |
title_full_unstemmed | Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications |
title_short | Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications |
title_sort | prospects for microwave plasma synthesized n-graphene in secondary electron emission mitigation applications |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7398926/ https://www.ncbi.nlm.nih.gov/pubmed/32747630 http://dx.doi.org/10.1038/s41598-020-69844-9 |
work_keys_str_mv | AT bundaleskan prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT diasa prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT bundaleskin prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT felizardoe prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT henriquesj prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT tsyganovd prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT abrashevm prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT valchevae prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT kissovskij prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT ferrariaam prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT doregoambotelho prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT almeidaa prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT zavasnikj prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT cvelbaru prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT teodoroomnd prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT strunskusth prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications AT tatarovae prospectsformicrowaveplasmasynthesizedngrapheneinsecondaryelectronemissionmitigationapplications |