Spectroscopic Properties of Si-nc in SiO(x) Films Using HFCVD

In the present work, non-stoichiometric silicon oxide films (SiO(x)) deposited using a hot filament chemical vapor deposition technique at short time and simple parameters of depositions are reported. This is motivated by the numerous potential applications of SiO(x) films in areas such as optoelect...

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Detalles Bibliográficos
Autores principales: Hernández Simón, Zaira Jocelyn, Luna López, Jose Alberto, de la Luz, Alvaro David Hernández, Pérez García, Sergio Alfonso, Benítez Lara, Alfredo, García Salgado, Godofredo, Carrillo López, Jesus, Mendoza Conde, Gabriel Omar, Martínez Hernández, Hayde Patricia
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7407559/
https://www.ncbi.nlm.nih.gov/pubmed/32698419
http://dx.doi.org/10.3390/nano10071415

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7407559/
https://www.ncbi.nlm.nih.gov/pubmed/32698419
http://dx.doi.org/10.3390/nano10071415

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