Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching

This work reports a batch fabrication process for silicon nanometer tip based on isotropic inductively coupled plasma (ICP) etching technology. The silicon tips with nanometer apex and small surface roughness are produced at wafer-level with good etching homogeneity and repeatability. An ICP etching...

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Detalles Bibliográficos
Autores principales: Wang, Lihao, Liu, Meijie, Zhao, Junyuan, Zhao, Jicong, Zhu, Yinfang, Yang, Jinling, Yang, Fuhua
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7408416/
https://www.ncbi.nlm.nih.gov/pubmed/32610624
http://dx.doi.org/10.3390/mi11070638

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7408416/
https://www.ncbi.nlm.nih.gov/pubmed/32610624
http://dx.doi.org/10.3390/mi11070638

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