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Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching
This work reports a batch fabrication process for silicon nanometer tip based on isotropic inductively coupled plasma (ICP) etching technology. The silicon tips with nanometer apex and small surface roughness are produced at wafer-level with good etching homogeneity and repeatability. An ICP etching...
Autores principales: | Wang, Lihao, Liu, Meijie, Zhao, Junyuan, Zhao, Jicong, Zhu, Yinfang, Yang, Jinling, Yang, Fuhua |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7408416/ https://www.ncbi.nlm.nih.gov/pubmed/32610624 http://dx.doi.org/10.3390/mi11070638 |
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