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Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms

In this paper, we have investigated the deposition of thin films from natural carvacrol extract using dielectric barrier discharge (DBD) plasma polymerization, aiming at the inhibition of bacteria adhesion and proliferation. The films deposited on stainless steel samples have been characterized by s...

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Detalles Bibliográficos
Autores principales: Getnet, Tsegaye Gashaw, da Silva, Gabriela F., S. Duarte, Iolanda, Kayama, Milton E., Rangel, Elidiane C., Cruz, Nilson C.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7411687/
https://www.ncbi.nlm.nih.gov/pubmed/32679884
http://dx.doi.org/10.3390/ma13143166
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author Getnet, Tsegaye Gashaw
da Silva, Gabriela F.
S. Duarte, Iolanda
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
author_facet Getnet, Tsegaye Gashaw
da Silva, Gabriela F.
S. Duarte, Iolanda
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
author_sort Getnet, Tsegaye Gashaw
collection PubMed
description In this paper, we have investigated the deposition of thin films from natural carvacrol extract using dielectric barrier discharge (DBD) plasma polymerization, aiming at the inhibition of bacteria adhesion and proliferation. The films deposited on stainless steel samples have been characterized by scanning electron microscopy, infrared reflectance-absorbance spectroscopy, profilometry, and contact angle measurements. Films with thicknesses ranging from 1.5 μm to 3.5 μm presented a chemical structure similar to that of carvacrol. While the formation of biofilm was observed on untreated samples, the coating completely inhibited the adhesion of E. coli and reduced the adhesion of S. aureus biofilm in more than 90%.
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spelling pubmed-74116872020-08-25 Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms Getnet, Tsegaye Gashaw da Silva, Gabriela F. S. Duarte, Iolanda Kayama, Milton E. Rangel, Elidiane C. Cruz, Nilson C. Materials (Basel) Article In this paper, we have investigated the deposition of thin films from natural carvacrol extract using dielectric barrier discharge (DBD) plasma polymerization, aiming at the inhibition of bacteria adhesion and proliferation. The films deposited on stainless steel samples have been characterized by scanning electron microscopy, infrared reflectance-absorbance spectroscopy, profilometry, and contact angle measurements. Films with thicknesses ranging from 1.5 μm to 3.5 μm presented a chemical structure similar to that of carvacrol. While the formation of biofilm was observed on untreated samples, the coating completely inhibited the adhesion of E. coli and reduced the adhesion of S. aureus biofilm in more than 90%. MDPI 2020-07-15 /pmc/articles/PMC7411687/ /pubmed/32679884 http://dx.doi.org/10.3390/ma13143166 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Getnet, Tsegaye Gashaw
da Silva, Gabriela F.
S. Duarte, Iolanda
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms
title Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms
title_full Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms
title_fullStr Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms
title_full_unstemmed Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms
title_short Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms
title_sort atmospheric pressure plasma chemical vapor deposition of carvacrol thin films on stainless steel to reduce the formation of e. coli and s. aureus biofilms
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7411687/
https://www.ncbi.nlm.nih.gov/pubmed/32679884
http://dx.doi.org/10.3390/ma13143166
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