Trace metal analysis of element on material surface using pulse CO(2) laser-induced breakdown spectroscopy applying vaporization technique

Trace elemental analysis on a surface of material has been recently imperative to be carried out especially in material industries. In this study, sophisticated setup of laser-induced breakdown spectroscopy has been arranged and demonstrated by employing vaporization technique for the trace elemental analysis on a surface of material without ablating the material itself. Experimentally, a pulse transversely excited atmospheric CO(2) laser was directed and defocused at +5 mm on a Si surface at inclining degree of approximately 25(o) to vaporize the trace metal element from the Si surface to the Pt mesh combined with Cu plate. The vaporized trace metal element then attached and deposited on the mesh surface. The trace metal attached-Pt mesh was then bombarded by focused laser beam to induce a luminous plasma and finally the trace element was identified. Results certified that sensitive trace elemental analysis of Cr deposited on the Si surface has been successfully carried out without any ablation of Si surface. Good linear calibration curve of Cr with an intercept zero was produced, which results in limit of detection of Cr of approximately 100 ppb.