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Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process

Mechanoluminescence (ML), which emits light upon external mechanical stress, was applied to fibrous composites. Herein, ML particles were incorporated into poly(vinylidene fluoride) (PVDF) and polyacrylonitrile (PAN) electrospun webs to prepare ML/PVDF and ML/PAN composite fabrics. The produced fabr...

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Autores principales: Lee, Halim, Cho, Eunjin, Kerekes, Tomas Webbe, Kwon, Seung Lee, Yun, Gun Jin, Kim, Jooyoun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7464265/
https://www.ncbi.nlm.nih.gov/pubmed/32751871
http://dx.doi.org/10.3390/polym12081720
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author Lee, Halim
Cho, Eunjin
Kerekes, Tomas Webbe
Kwon, Seung Lee
Yun, Gun Jin
Kim, Jooyoun
author_facet Lee, Halim
Cho, Eunjin
Kerekes, Tomas Webbe
Kwon, Seung Lee
Yun, Gun Jin
Kim, Jooyoun
author_sort Lee, Halim
collection PubMed
description Mechanoluminescence (ML), which emits light upon external mechanical stress, was applied to fibrous composites. Herein, ML particles were incorporated into poly(vinylidene fluoride) (PVDF) and polyacrylonitrile (PAN) electrospun webs to prepare ML/PVDF and ML/PAN composite fabrics. The produced fabrics were treated with O(2) and C(4)F(8) plasma to modify the wetting properties, then the effects of composite wettability on the light-emitting response in dry and wet conditions were investigated. The light intensity was greatly decreased when the composite fabrics absorbed water. When the composites were hydrophobized by the C(4)F(8) plasma-enhanced chemical vapor deposition process, the original light intensity was protected in wet conditions, while maintaining the water vapor transmission rate. As the clothing material would be exposed to moisture in varied situations, the reduced ML sensitivity in wet conditions may limit the application of ML composite fabrics. The findings suggest a facile strategy to fabricate moisture-resistant, breathable mechanoluminescence composite fabrics.
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spelling pubmed-74642652020-09-04 Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process Lee, Halim Cho, Eunjin Kerekes, Tomas Webbe Kwon, Seung Lee Yun, Gun Jin Kim, Jooyoun Polymers (Basel) Article Mechanoluminescence (ML), which emits light upon external mechanical stress, was applied to fibrous composites. Herein, ML particles were incorporated into poly(vinylidene fluoride) (PVDF) and polyacrylonitrile (PAN) electrospun webs to prepare ML/PVDF and ML/PAN composite fabrics. The produced fabrics were treated with O(2) and C(4)F(8) plasma to modify the wetting properties, then the effects of composite wettability on the light-emitting response in dry and wet conditions were investigated. The light intensity was greatly decreased when the composite fabrics absorbed water. When the composites were hydrophobized by the C(4)F(8) plasma-enhanced chemical vapor deposition process, the original light intensity was protected in wet conditions, while maintaining the water vapor transmission rate. As the clothing material would be exposed to moisture in varied situations, the reduced ML sensitivity in wet conditions may limit the application of ML composite fabrics. The findings suggest a facile strategy to fabricate moisture-resistant, breathable mechanoluminescence composite fabrics. MDPI 2020-07-31 /pmc/articles/PMC7464265/ /pubmed/32751871 http://dx.doi.org/10.3390/polym12081720 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Lee, Halim
Cho, Eunjin
Kerekes, Tomas Webbe
Kwon, Seung Lee
Yun, Gun Jin
Kim, Jooyoun
Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_full Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_fullStr Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_full_unstemmed Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_short Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_sort water-resistant mechanoluminescent electrospun fabrics with protected sensitivity in wet condition via plasma-enhanced chemical vapor deposition process
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7464265/
https://www.ncbi.nlm.nih.gov/pubmed/32751871
http://dx.doi.org/10.3390/polym12081720
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