Fabrication of Periodic Nanostructures on Silicon Suboxide Films with Plasmonic Near-Field Ablation Induced by Low-Fluence Femtosecond Laser Pulses

Silicon suboxide (SiO(x), x ≈ 1) is a substoichiometric silicon oxide with a large refractive index and optical absorption coefficient that oxidizes to silica (SiO(2)) by annealing in air at ~1000 °C. We demonstrate that nanostructures with a groove period of 200–330 nm can be formed in air on a sil...

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Detalles Bibliográficos
Autores principales: Takaya, Tatsuyoshi, Miyaji, Godai, Takahashi, Issei, Richter, Lukas Janos, Ihlemann, Jürgen
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7466530/
https://www.ncbi.nlm.nih.gov/pubmed/32751542
http://dx.doi.org/10.3390/nano10081495

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7466530/
https://www.ncbi.nlm.nih.gov/pubmed/32751542
http://dx.doi.org/10.3390/nano10081495

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