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Internal Surface Plasmon Excitation as the Root Cause of Laser-Induced Periodic Plasma Structure and Self-Organized Nanograting Formation in the Volume of Transparent Dielectric
A computer simulation of the dynamics of an optical discharge produced in the volume of a transparent dielectric (fused silica) by a focused femtosecond laser pulse was carried out taking into account the possibility of developing small-scale ionization-field instability. The presence of small forei...
Autores principales: | , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7466590/ https://www.ncbi.nlm.nih.gov/pubmed/32722572 http://dx.doi.org/10.3390/nano10081461 |
Sumario: | A computer simulation of the dynamics of an optical discharge produced in the volume of a transparent dielectric (fused silica) by a focused femtosecond laser pulse was carried out taking into account the possibility of developing small-scale ionization-field instability. The presence of small foreign inclusions in the fused silica was taken into account with the model of a nanodispersed heterogeneous medium by using Maxwell Garnett formulas. The results of the calculations made it possible to reveal the previously unknown physical mechanism that determines the periodicity of the ordered plasma-field structure that is formed in each single breakdown pulse and is the root cause of the ordered volume nanograting formation in dielectric material exposed to a series of repeated pulses. Two main points are decisive in this mechanism: (i) the formation of a thin overcritical plasma layer at the breakdown wave front counter-propagated to the incident laser pulse and (ii) the excitation of the “internal surface plasmon” at this front, resulting in a rapid amplification of the corresponding spatial harmonic of random seed perturbations in the plasma and formation of a contrast structure with a period equal to the wavelength of the surface plasmon (0.7 of the wavelength in dielectric). |
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