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Focus characterization of an X-ray free-electron laser by intensity correlation measurement of X-ray fluorescence

This paper proposes and demonstrates a simple method using the intensity correlation of X-ray fluorescence to evaluate the focused beam size of an X-ray free-electron laser (XFEL). This method was applied to the sub-micrometre focused XFEL beam at the SPring-8 Angstrom Compact Free Electron Laser, a...

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Detalles Bibliográficos
Autores principales: Nakamura, Nami, Matsuyama, Satoshi, Inoue, Takato, Inoue, Ichiro, Yamada, Jumpei, Osaka, Taito, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Union of Crystallography 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7467341/
https://www.ncbi.nlm.nih.gov/pubmed/32876613
http://dx.doi.org/10.1107/S1600577520009868
Descripción
Sumario:This paper proposes and demonstrates a simple method using the intensity correlation of X-ray fluorescence to evaluate the focused beam size of an X-ray free-electron laser (XFEL). This method was applied to the sub-micrometre focused XFEL beam at the SPring-8 Angstrom Compact Free Electron Laser, and the beam size evaluated using the proposed method was consistent with that measured using the knife-edge scan method. The proposed method is readily applicable to extremely small X-ray spots and can be applied for the precise diagnostics of sub-10 nm focused X-ray beams which have recently emerged.