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Direct measurement and correction of both megavoltage and kilovoltage scattered x‐rays for orthogonal kilovoltage imaging subsystems with dual flat panel detectors

PURPOSE: To measure the scattered x‐rays of megavoltage (MV) and kilovoltage (kV) beams (MV scatter and kV scatter, respectively) on the orthogonal kV imaging subsystems of Vero4DRT. METHODS: Images containing MV‐ and kV‐scatter from another source only (i.e., MV‐ and kV‐scatter maps) were acquired...

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Detalles Bibliográficos
Autores principales: Iramina, Hiraku, Nakamura, Mitsuhiro, Mizowaki, Takashi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7497931/
https://www.ncbi.nlm.nih.gov/pubmed/32710529
http://dx.doi.org/10.1002/acm2.12986