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Direct measurement and correction of both megavoltage and kilovoltage scattered x‐rays for orthogonal kilovoltage imaging subsystems with dual flat panel detectors
PURPOSE: To measure the scattered x‐rays of megavoltage (MV) and kilovoltage (kV) beams (MV scatter and kV scatter, respectively) on the orthogonal kV imaging subsystems of Vero4DRT. METHODS: Images containing MV‐ and kV‐scatter from another source only (i.e., MV‐ and kV‐scatter maps) were acquired...
Autores principales: | Iramina, Hiraku, Nakamura, Mitsuhiro, Mizowaki, Takashi |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
John Wiley and Sons Inc.
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7497931/ https://www.ncbi.nlm.nih.gov/pubmed/32710529 http://dx.doi.org/10.1002/acm2.12986 |
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