Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography

In the process of digital micromirror device (DMD) digital mask projection lithography, the lithography efficiency will be enhanced greatly by path planning of pattern transfer. This paper proposes a new dual operator and dual population ant colony (DODPACO) algorithm. Firstly, load operators and fe...

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Detalles Bibliográficos
Autores principales: Wang, Yingzhi, Han, Tailin, Jiang, Xu, Yan, Yuhan, Liu, Hong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7516752/
https://www.ncbi.nlm.nih.gov/pubmed/33286069
http://dx.doi.org/10.3390/e22030295

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7516752/
https://www.ncbi.nlm.nih.gov/pubmed/33286069
http://dx.doi.org/10.3390/e22030295

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