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Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography
In the process of digital micromirror device (DMD) digital mask projection lithography, the lithography efficiency will be enhanced greatly by path planning of pattern transfer. This paper proposes a new dual operator and dual population ant colony (DODPACO) algorithm. Firstly, load operators and fe...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7516752/ https://www.ncbi.nlm.nih.gov/pubmed/33286069 http://dx.doi.org/10.3390/e22030295 |