Controlling the flux of reactive species: a case study on thin film deposition in an aniline/argon plasma

The plasma based synthesis of thin films is frequently used to deposit ultra-thin and pinhole-free films on a wide class of different substrates. However, the synthesis of thin films by means of low temperature plasmas is rather complex due to the great number of different species (neutrals, radical...

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Detalles Bibliográficos
Autores principales: Sciacqua, D., Pattyn, C., Jagodar, A., von Wahl, E., Lecas, T., Strunskus, T., Kovacevic, E., Berndt, J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7522240/
https://www.ncbi.nlm.nih.gov/pubmed/32985556
http://dx.doi.org/10.1038/s41598-020-72634-y

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7522240/
https://www.ncbi.nlm.nih.gov/pubmed/32985556
http://dx.doi.org/10.1038/s41598-020-72634-y

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