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Design of CMOS-compatible metal–insulator–metal metasurfaces via extended equivalent-circuit analysis
Photonic metasurfaces compatible with large-scale production such as CMOS are of importance because they promise cointegration of electronics with photonics for detection, communication and sensing. The main challenges on the way of designing such metasurfaces are: (1) large variety of possible geom...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7578050/ https://www.ncbi.nlm.nih.gov/pubmed/33087776 http://dx.doi.org/10.1038/s41598-020-74849-5 |