Cargando…

Ultimate Spin Currents in Commercial Chemical Vapor Deposited Graphene

[Image: see text] Establishing ultimate spin current efficiency in graphene over industry-standard substrates can facilitate research and development exploration of spin current functions and spin sensing. At the same time, it can resolve core issues in spin relaxation physics while addressing the s...

Descripción completa

Detalles Bibliográficos
Autores principales: Panda, J., Ramu, M., Karis, Olof, Sarkar, Tapati, Kamalakar, M. Venkata
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2020
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7596785/
https://www.ncbi.nlm.nih.gov/pubmed/32945650
http://dx.doi.org/10.1021/acsnano.0c03376
_version_ 1783602185511108608
author Panda, J.
Ramu, M.
Karis, Olof
Sarkar, Tapati
Kamalakar, M. Venkata
author_facet Panda, J.
Ramu, M.
Karis, Olof
Sarkar, Tapati
Kamalakar, M. Venkata
author_sort Panda, J.
collection PubMed
description [Image: see text] Establishing ultimate spin current efficiency in graphene over industry-standard substrates can facilitate research and development exploration of spin current functions and spin sensing. At the same time, it can resolve core issues in spin relaxation physics while addressing the skepticism of graphene’s practicality for planar spintronic applications. In this work, we reveal an exceptionally long spin communication capability of 45 μm and highest to date spin diffusion length of 13.6 μm in graphene on SiO(2)/Si at room temperature. Employing commercial chemical vapor deposited (CVD) graphene, we show how contact-induced surface charge transfer doping and device doping contributions, as well as spin relaxation, can be quenched in extremely long spin channels and thereby enable unexpectedly long spin diffusion lengths in polycrystalline CVD graphene. Extensive experiments show enhanced spin transport and precession in multiple longest channels (36 and 45 μm) that reveal the highest spin lifetime of ∼2.5–3.5 ns in graphene over SiO(2)/Si, even under ambient conditions. Such performance, made possible due to our devices approaching the intrinsic spin–orbit coupling of ∼20 μeV in graphene, reveals the role of the D’yakonov–Perel’ spin relaxation mechanism in graphene channels as well as contact regions. Our record demonstration, fresh device engineering, and spin relaxation insights unlock the ultimate spin current capabilities of graphene on SiO(2)/Si, while the robust high performance of commercial CVD graphene can proliferate research and development of innovative spin sensors and spin computing circuits.
format Online
Article
Text
id pubmed-7596785
institution National Center for Biotechnology Information
language English
publishDate 2020
publisher American Chemical Society
record_format MEDLINE/PubMed
spelling pubmed-75967852020-10-30 Ultimate Spin Currents in Commercial Chemical Vapor Deposited Graphene Panda, J. Ramu, M. Karis, Olof Sarkar, Tapati Kamalakar, M. Venkata ACS Nano [Image: see text] Establishing ultimate spin current efficiency in graphene over industry-standard substrates can facilitate research and development exploration of spin current functions and spin sensing. At the same time, it can resolve core issues in spin relaxation physics while addressing the skepticism of graphene’s practicality for planar spintronic applications. In this work, we reveal an exceptionally long spin communication capability of 45 μm and highest to date spin diffusion length of 13.6 μm in graphene on SiO(2)/Si at room temperature. Employing commercial chemical vapor deposited (CVD) graphene, we show how contact-induced surface charge transfer doping and device doping contributions, as well as spin relaxation, can be quenched in extremely long spin channels and thereby enable unexpectedly long spin diffusion lengths in polycrystalline CVD graphene. Extensive experiments show enhanced spin transport and precession in multiple longest channels (36 and 45 μm) that reveal the highest spin lifetime of ∼2.5–3.5 ns in graphene over SiO(2)/Si, even under ambient conditions. Such performance, made possible due to our devices approaching the intrinsic spin–orbit coupling of ∼20 μeV in graphene, reveals the role of the D’yakonov–Perel’ spin relaxation mechanism in graphene channels as well as contact regions. Our record demonstration, fresh device engineering, and spin relaxation insights unlock the ultimate spin current capabilities of graphene on SiO(2)/Si, while the robust high performance of commercial CVD graphene can proliferate research and development of innovative spin sensors and spin computing circuits. American Chemical Society 2020-09-18 2020-10-27 /pmc/articles/PMC7596785/ /pubmed/32945650 http://dx.doi.org/10.1021/acsnano.0c03376 Text en This is an open access article published under a Creative Commons Attribution (CC-BY) License (http://pubs.acs.org/page/policy/authorchoice_ccby_termsofuse.html) , which permits unrestricted use, distribution and reproduction in any medium, provided the author and source are cited.
spellingShingle Panda, J.
Ramu, M.
Karis, Olof
Sarkar, Tapati
Kamalakar, M. Venkata
Ultimate Spin Currents in Commercial Chemical Vapor Deposited Graphene
title Ultimate Spin Currents in Commercial Chemical Vapor Deposited Graphene
title_full Ultimate Spin Currents in Commercial Chemical Vapor Deposited Graphene
title_fullStr Ultimate Spin Currents in Commercial Chemical Vapor Deposited Graphene
title_full_unstemmed Ultimate Spin Currents in Commercial Chemical Vapor Deposited Graphene
title_short Ultimate Spin Currents in Commercial Chemical Vapor Deposited Graphene
title_sort ultimate spin currents in commercial chemical vapor deposited graphene
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7596785/
https://www.ncbi.nlm.nih.gov/pubmed/32945650
http://dx.doi.org/10.1021/acsnano.0c03376
work_keys_str_mv AT pandaj ultimatespincurrentsincommercialchemicalvapordepositedgraphene
AT ramum ultimatespincurrentsincommercialchemicalvapordepositedgraphene
AT karisolof ultimatespincurrentsincommercialchemicalvapordepositedgraphene
AT sarkartapati ultimatespincurrentsincommercialchemicalvapordepositedgraphene
AT kamalakarmvenkata ultimatespincurrentsincommercialchemicalvapordepositedgraphene