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Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography
Photoresists (or photo-resins) are the main and most important raw material used for lithography techniques such as deep X-ray (DXRL), ultraviolet (UVL), deep-UV (DUVL), and extreme UV (EUVL). In previous work, we showed how complicated could be the synthesis of the resins used to produce photoresis...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7650645/ https://www.ncbi.nlm.nih.gov/pubmed/33066642 http://dx.doi.org/10.3390/polym12102359 |