Cargando…

Electrochemical deposition of N-heterocyclic carbene monolayers on metal surfaces

N-heterocyclic carbenes (NHCs) have been widely utilized for the formation of self-assembled monolayers (SAMs) on various surfaces. The main methodologies for preparation of NHCs-based SAMs either requires inert atmosphere and strong base for deprotonation of imidazolium precursors or the use of spe...

Descripción completa

Detalles Bibliográficos
Autores principales: Amit, Einav, Dery, Linoy, Dery, Shahar, Kim, Suhong, Roy, Anirban, Hu, Qichi, Gutkin, Vitaly, Eisenberg, Helen, Stein, Tamar, Mandler, Daniel, Dean Toste, F., Gross, Elad
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7658200/
https://www.ncbi.nlm.nih.gov/pubmed/33177496
http://dx.doi.org/10.1038/s41467-020-19500-7
_version_ 1783608617438543872
author Amit, Einav
Dery, Linoy
Dery, Shahar
Kim, Suhong
Roy, Anirban
Hu, Qichi
Gutkin, Vitaly
Eisenberg, Helen
Stein, Tamar
Mandler, Daniel
Dean Toste, F.
Gross, Elad
author_facet Amit, Einav
Dery, Linoy
Dery, Shahar
Kim, Suhong
Roy, Anirban
Hu, Qichi
Gutkin, Vitaly
Eisenberg, Helen
Stein, Tamar
Mandler, Daniel
Dean Toste, F.
Gross, Elad
author_sort Amit, Einav
collection PubMed
description N-heterocyclic carbenes (NHCs) have been widely utilized for the formation of self-assembled monolayers (SAMs) on various surfaces. The main methodologies for preparation of NHCs-based SAMs either requires inert atmosphere and strong base for deprotonation of imidazolium precursors or the use of specifically-synthesized precursors such as NHC(H)[HCO(3)] salts or NHC–CO(2) adducts. Herein, we demonstrate an electrochemical approach for surface-anchoring of NHCs which overcomes the need for dry environment, addition of exogenous strong base or restricting synthetic steps. In the electrochemical deposition, water reduction reaction is used to generate high concentration of hydroxide ions in proximity to a metal electrode. Imidazolium cations were deprotonated by hydroxide ions, leading to carbenes formation that self-assembled on the electrode’s surface. SAMs of NO(2)-functionalized NHCs and dimethyl-benzimidazole were electrochemically deposited on Au films. SAMs of NHCs were also electrochemically deposited on Pt, Pd and Ag films, demonstrating the wide metal scope of this deposition technique.
format Online
Article
Text
id pubmed-7658200
institution National Center for Biotechnology Information
language English
publishDate 2020
publisher Nature Publishing Group UK
record_format MEDLINE/PubMed
spelling pubmed-76582002020-11-12 Electrochemical deposition of N-heterocyclic carbene monolayers on metal surfaces Amit, Einav Dery, Linoy Dery, Shahar Kim, Suhong Roy, Anirban Hu, Qichi Gutkin, Vitaly Eisenberg, Helen Stein, Tamar Mandler, Daniel Dean Toste, F. Gross, Elad Nat Commun Article N-heterocyclic carbenes (NHCs) have been widely utilized for the formation of self-assembled monolayers (SAMs) on various surfaces. The main methodologies for preparation of NHCs-based SAMs either requires inert atmosphere and strong base for deprotonation of imidazolium precursors or the use of specifically-synthesized precursors such as NHC(H)[HCO(3)] salts or NHC–CO(2) adducts. Herein, we demonstrate an electrochemical approach for surface-anchoring of NHCs which overcomes the need for dry environment, addition of exogenous strong base or restricting synthetic steps. In the electrochemical deposition, water reduction reaction is used to generate high concentration of hydroxide ions in proximity to a metal electrode. Imidazolium cations were deprotonated by hydroxide ions, leading to carbenes formation that self-assembled on the electrode’s surface. SAMs of NO(2)-functionalized NHCs and dimethyl-benzimidazole were electrochemically deposited on Au films. SAMs of NHCs were also electrochemically deposited on Pt, Pd and Ag films, demonstrating the wide metal scope of this deposition technique. Nature Publishing Group UK 2020-11-11 /pmc/articles/PMC7658200/ /pubmed/33177496 http://dx.doi.org/10.1038/s41467-020-19500-7 Text en © The Author(s) 2020 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Amit, Einav
Dery, Linoy
Dery, Shahar
Kim, Suhong
Roy, Anirban
Hu, Qichi
Gutkin, Vitaly
Eisenberg, Helen
Stein, Tamar
Mandler, Daniel
Dean Toste, F.
Gross, Elad
Electrochemical deposition of N-heterocyclic carbene monolayers on metal surfaces
title Electrochemical deposition of N-heterocyclic carbene monolayers on metal surfaces
title_full Electrochemical deposition of N-heterocyclic carbene monolayers on metal surfaces
title_fullStr Electrochemical deposition of N-heterocyclic carbene monolayers on metal surfaces
title_full_unstemmed Electrochemical deposition of N-heterocyclic carbene monolayers on metal surfaces
title_short Electrochemical deposition of N-heterocyclic carbene monolayers on metal surfaces
title_sort electrochemical deposition of n-heterocyclic carbene monolayers on metal surfaces
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7658200/
https://www.ncbi.nlm.nih.gov/pubmed/33177496
http://dx.doi.org/10.1038/s41467-020-19500-7
work_keys_str_mv AT amiteinav electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT derylinoy electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT deryshahar electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT kimsuhong electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT royanirban electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT huqichi electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT gutkinvitaly electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT eisenberghelen electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT steintamar electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT mandlerdaniel electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT deantostef electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces
AT grosselad electrochemicaldepositionofnheterocycliccarbenemonolayersonmetalsurfaces