Cargando…
Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes
Exploiting polaritons in natural vdW materials has been successful in achieving extreme light confinement and low-loss optical devices and enabling simplified device integration. Recently, α-MoO(3) has been reported as a semiconducting biaxial vdW material capable of sustaining naturally orthogonal...
Autores principales: | , , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2020
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7666183/ https://www.ncbi.nlm.nih.gov/pubmed/33188172 http://dx.doi.org/10.1038/s41467-020-19499-x |
_version_ | 1783610085493178368 |
---|---|
author | Abedini Dereshgi, Sina Folland, Thomas G. Murthy, Akshay A. Song, Xianglian Tanriover, Ibrahim Dravid, Vinayak P. Caldwell, Joshua D. Aydin, Koray |
author_facet | Abedini Dereshgi, Sina Folland, Thomas G. Murthy, Akshay A. Song, Xianglian Tanriover, Ibrahim Dravid, Vinayak P. Caldwell, Joshua D. Aydin, Koray |
author_sort | Abedini Dereshgi, Sina |
collection | PubMed |
description | Exploiting polaritons in natural vdW materials has been successful in achieving extreme light confinement and low-loss optical devices and enabling simplified device integration. Recently, α-MoO(3) has been reported as a semiconducting biaxial vdW material capable of sustaining naturally orthogonal in-plane phonon polariton modes in IR. In this study, we investigate the polarization-dependent optical characteristics of cavities formed using α-MoO(3) to extend the degrees of freedom in the design of IR photonic components exploiting the in-plane anisotropy of this material. Polarization-dependent absorption over 80% in a multilayer Fabry-Perot structure with α-MoO(3) is reported without the need for nanoscale fabrication on the α-MoO(3). We observe coupling between the α-MoO(3) optical phonons and the Fabry-Perot cavity resonances. Using cross-polarized reflectance spectroscopy we show that the strong birefringence results in 15% of the total power converted into the orthogonal polarization with respect to incident wave. These findings can open new avenues in the quest for polarization filters and low-loss, integrated planar IR photonics and in dictating polarization control. |
format | Online Article Text |
id | pubmed-7666183 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-76661832020-11-17 Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes Abedini Dereshgi, Sina Folland, Thomas G. Murthy, Akshay A. Song, Xianglian Tanriover, Ibrahim Dravid, Vinayak P. Caldwell, Joshua D. Aydin, Koray Nat Commun Article Exploiting polaritons in natural vdW materials has been successful in achieving extreme light confinement and low-loss optical devices and enabling simplified device integration. Recently, α-MoO(3) has been reported as a semiconducting biaxial vdW material capable of sustaining naturally orthogonal in-plane phonon polariton modes in IR. In this study, we investigate the polarization-dependent optical characteristics of cavities formed using α-MoO(3) to extend the degrees of freedom in the design of IR photonic components exploiting the in-plane anisotropy of this material. Polarization-dependent absorption over 80% in a multilayer Fabry-Perot structure with α-MoO(3) is reported without the need for nanoscale fabrication on the α-MoO(3). We observe coupling between the α-MoO(3) optical phonons and the Fabry-Perot cavity resonances. Using cross-polarized reflectance spectroscopy we show that the strong birefringence results in 15% of the total power converted into the orthogonal polarization with respect to incident wave. These findings can open new avenues in the quest for polarization filters and low-loss, integrated planar IR photonics and in dictating polarization control. Nature Publishing Group UK 2020-11-13 /pmc/articles/PMC7666183/ /pubmed/33188172 http://dx.doi.org/10.1038/s41467-020-19499-x Text en © The Author(s) 2020 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Abedini Dereshgi, Sina Folland, Thomas G. Murthy, Akshay A. Song, Xianglian Tanriover, Ibrahim Dravid, Vinayak P. Caldwell, Joshua D. Aydin, Koray Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes |
title | Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes |
title_full | Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes |
title_fullStr | Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes |
title_full_unstemmed | Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes |
title_short | Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes |
title_sort | lithography-free ir polarization converters via orthogonal in-plane phonons in α-moo(3) flakes |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7666183/ https://www.ncbi.nlm.nih.gov/pubmed/33188172 http://dx.doi.org/10.1038/s41467-020-19499-x |
work_keys_str_mv | AT abedinidereshgisina lithographyfreeirpolarizationconvertersviaorthogonalinplanephononsinamoo3flakes AT follandthomasg lithographyfreeirpolarizationconvertersviaorthogonalinplanephononsinamoo3flakes AT murthyakshaya lithographyfreeirpolarizationconvertersviaorthogonalinplanephononsinamoo3flakes AT songxianglian lithographyfreeirpolarizationconvertersviaorthogonalinplanephononsinamoo3flakes AT tanrioveribrahim lithographyfreeirpolarizationconvertersviaorthogonalinplanephononsinamoo3flakes AT dravidvinayakp lithographyfreeirpolarizationconvertersviaorthogonalinplanephononsinamoo3flakes AT caldwelljoshuad lithographyfreeirpolarizationconvertersviaorthogonalinplanephononsinamoo3flakes AT aydinkoray lithographyfreeirpolarizationconvertersviaorthogonalinplanephononsinamoo3flakes |