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Extremely hard and tough high entropy nitride ceramics

Simultaneously hard and tough nitride ceramics open new venues for a variety of advanced applications. To produce such materials, attention is focused on the development of high-entropy ceramics, containing four or more metallic components distributed homogeneously in the metallic sublattice. While...

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Detalles Bibliográficos
Autores principales: Moskovskikh, Dmitry, Vorotilo, Stepan, Buinevich, Veronika, Sedegov, Alexey, Kuskov, Kirill, Khort, Alexander, Shuck, Christopher, Zhukovskyi, Maksim, Mukasyan, Alexander
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7669861/
https://www.ncbi.nlm.nih.gov/pubmed/33199795
http://dx.doi.org/10.1038/s41598-020-76945-y
Descripción
Sumario:Simultaneously hard and tough nitride ceramics open new venues for a variety of advanced applications. To produce such materials, attention is focused on the development of high-entropy ceramics, containing four or more metallic components distributed homogeneously in the metallic sublattice. While the fabrication of bulk high-entropy carbides and borides is well established, high-entropy nitrides have only been produced as thin films. Herein, we report on a newel three-step process to fabricate bulk high-entropy nitrides. The high-entropy nitride phase was obtained by exothermic combustion of mechanically-activated nanostructured metallic precursors in nitrogen and consolidated by spark plasma sintering. The fabricated bulk high-entropy nitride (Hf(0.2)Nb(0.2)Ta(0.2)Ti(0.2)Zr(0.2))N demonstrates outstanding hardness (up to 33 GPa) and fracture toughness (up to 5.2 MPa∙m(1/2)), significantly surpassing expected values from mixture rules, as well as all other reported binary and high-entropy ceramics and can be used for super-hard coatings, structural materials, optics, and others. The obtained results illustrate the scalable method to produce bulk high-entropy nitrides with the new benchmark properties.