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Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film

The 2019 coronavirus disease (COVID-19) has affected more than 200 countries. Wearing masks can effectively cut off the virus spreading route since the coronavirus is mainly spreading by respiratory droplets. However, the common surgical masks cannot be reused, resulting in the increasing economic a...

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Detalles Bibliográficos
Autores principales: Lin, Zezhou, Wang, Zheng, Zhang, Xi, Diao, Dongfeng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Tsinghua University Press 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7685909/
https://www.ncbi.nlm.nih.gov/pubmed/33250970
http://dx.doi.org/10.1007/s12274-020-3158-1
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author Lin, Zezhou
Wang, Zheng
Zhang, Xi
Diao, Dongfeng
author_facet Lin, Zezhou
Wang, Zheng
Zhang, Xi
Diao, Dongfeng
author_sort Lin, Zezhou
collection PubMed
description The 2019 coronavirus disease (COVID-19) has affected more than 200 countries. Wearing masks can effectively cut off the virus spreading route since the coronavirus is mainly spreading by respiratory droplets. However, the common surgical masks cannot be reused, resulting in the increasing economic and resource consumption around the world. Herein, we report a superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film, with high-density edges of standing structured graphene nanosheets. The GNEC mask exhibits an excellent hydrophobic ability (water contact angle: 157.9°) and an outstanding filtration efficiency with 100% bacterial filtration efficiency (BFE). In addition, the GNEC mask shows the prominent photo-sterilize performance, heating up to 110 °C quickly under the solar illumination. These high performances may facilitate the combat against the COVID-19 outbreaks, while the reusable masks help reducing the economic and resource consumption. [Image: see text] ELECTRONIC SUPPLEMENTARY MATERIAL: Supplementary material (further details of electron cyclotron resonance (ECR) sputtering system, deposition of GNEC film, fabrication of GNEC mask, and characterization of the GNEC mask) is available in the online version of this article at 10.1007/s12274-020-3158-1.
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spelling pubmed-76859092020-11-25 Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film Lin, Zezhou Wang, Zheng Zhang, Xi Diao, Dongfeng Nano Res Research Article The 2019 coronavirus disease (COVID-19) has affected more than 200 countries. Wearing masks can effectively cut off the virus spreading route since the coronavirus is mainly spreading by respiratory droplets. However, the common surgical masks cannot be reused, resulting in the increasing economic and resource consumption around the world. Herein, we report a superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film, with high-density edges of standing structured graphene nanosheets. The GNEC mask exhibits an excellent hydrophobic ability (water contact angle: 157.9°) and an outstanding filtration efficiency with 100% bacterial filtration efficiency (BFE). In addition, the GNEC mask shows the prominent photo-sterilize performance, heating up to 110 °C quickly under the solar illumination. These high performances may facilitate the combat against the COVID-19 outbreaks, while the reusable masks help reducing the economic and resource consumption. [Image: see text] ELECTRONIC SUPPLEMENTARY MATERIAL: Supplementary material (further details of electron cyclotron resonance (ECR) sputtering system, deposition of GNEC film, fabrication of GNEC mask, and characterization of the GNEC mask) is available in the online version of this article at 10.1007/s12274-020-3158-1. Tsinghua University Press 2020-11-25 2021 /pmc/articles/PMC7685909/ /pubmed/33250970 http://dx.doi.org/10.1007/s12274-020-3158-1 Text en © Tsinghua University Press and Springer-Verlag GmbH Germany, part of Springer Nature 2020 This article is made available via the PMC Open Access Subset for unrestricted research re-use and secondary analysis in any form or by any means with acknowledgement of the original source. These permissions are granted for the duration of the World Health Organization (WHO) declaration of COVID-19 as a global pandemic.
spellingShingle Research Article
Lin, Zezhou
Wang, Zheng
Zhang, Xi
Diao, Dongfeng
Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film
title Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film
title_full Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film
title_fullStr Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film
title_full_unstemmed Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film
title_short Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film
title_sort superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (gnec) film
topic Research Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7685909/
https://www.ncbi.nlm.nih.gov/pubmed/33250970
http://dx.doi.org/10.1007/s12274-020-3158-1
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