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Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations

Eugenol (4-Allyl-2-methoxyphenol) is the main constituent of clove oil. In addition to being widely used as a condiment, it has been recognized as a powerful bactericide. Owing to that, Eugenol has been used in several applications including odontology and as a conservative for food products. Aiming...

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Detalles Bibliográficos
Autores principales: Getnet, Tsegaye Gashaw, Kayama, Milton E., Rangel, Elidiane C., Cruz, Nilson C.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7697465/
https://www.ncbi.nlm.nih.gov/pubmed/33207536
http://dx.doi.org/10.3390/polym12112692
_version_ 1783615607020716032
author Getnet, Tsegaye Gashaw
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
author_facet Getnet, Tsegaye Gashaw
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
author_sort Getnet, Tsegaye Gashaw
collection PubMed
description Eugenol (4-Allyl-2-methoxyphenol) is the main constituent of clove oil. In addition to being widely used as a condiment, it has been recognized as a powerful bactericide. Owing to that, Eugenol has been used in several applications including odontology and as a conservative for food products. Aiming at the development of natural bactericide coatings, in this work, using an atmospheric pressure plasma in a dielectric barrier discharge (DBD) reactor Eugenol was deposited on stainless steel substrate, with argon as a carrier gas. The discharge power supply was a transformer at 14.4 kV peak-to-peak voltage and 60 Hz frequency. Operating with a gas flow rate at 4 L/min, the active power was around 1.2 W. The maximum plasma electron temperature of the plasma with monomers was about 1.5 eV, estimated by visible emission spectroscopy using a local thermodynamic equilibrium approach. The study also comprehended the analysis of the film structure, aging, and thermal stability using infrared reflectance spectroscopy, and its thicknesses and roughness by profilometry. The thickness of the films was in the range of 1000 to 2400 nm with a roughness of up to 800 nm with good adhesion on the substrate. The FTIR result shows a stable coating with a chemical structure similar to that of the monomer. Aging analysis showed that the film does not degrade, even after exposing the film for 120 days in ambient air and for 1.0 h under a high thermal UV-lamp.
format Online
Article
Text
id pubmed-7697465
institution National Center for Biotechnology Information
language English
publishDate 2020
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-76974652020-11-29 Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations Getnet, Tsegaye Gashaw Kayama, Milton E. Rangel, Elidiane C. Cruz, Nilson C. Polymers (Basel) Article Eugenol (4-Allyl-2-methoxyphenol) is the main constituent of clove oil. In addition to being widely used as a condiment, it has been recognized as a powerful bactericide. Owing to that, Eugenol has been used in several applications including odontology and as a conservative for food products. Aiming at the development of natural bactericide coatings, in this work, using an atmospheric pressure plasma in a dielectric barrier discharge (DBD) reactor Eugenol was deposited on stainless steel substrate, with argon as a carrier gas. The discharge power supply was a transformer at 14.4 kV peak-to-peak voltage and 60 Hz frequency. Operating with a gas flow rate at 4 L/min, the active power was around 1.2 W. The maximum plasma electron temperature of the plasma with monomers was about 1.5 eV, estimated by visible emission spectroscopy using a local thermodynamic equilibrium approach. The study also comprehended the analysis of the film structure, aging, and thermal stability using infrared reflectance spectroscopy, and its thicknesses and roughness by profilometry. The thickness of the films was in the range of 1000 to 2400 nm with a roughness of up to 800 nm with good adhesion on the substrate. The FTIR result shows a stable coating with a chemical structure similar to that of the monomer. Aging analysis showed that the film does not degrade, even after exposing the film for 120 days in ambient air and for 1.0 h under a high thermal UV-lamp. MDPI 2020-11-16 /pmc/articles/PMC7697465/ /pubmed/33207536 http://dx.doi.org/10.3390/polym12112692 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Getnet, Tsegaye Gashaw
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title_full Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title_fullStr Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title_full_unstemmed Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title_short Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title_sort thin film deposition by atmospheric pressure dielectric barrier discharges containing eugenol: discharge and coating characterizations
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7697465/
https://www.ncbi.nlm.nih.gov/pubmed/33207536
http://dx.doi.org/10.3390/polym12112692
work_keys_str_mv AT getnettsegayegashaw thinfilmdepositionbyatmosphericpressuredielectricbarrierdischargescontainingeugenoldischargeandcoatingcharacterizations
AT kayamamiltone thinfilmdepositionbyatmosphericpressuredielectricbarrierdischargescontainingeugenoldischargeandcoatingcharacterizations
AT rangelelidianec thinfilmdepositionbyatmosphericpressuredielectricbarrierdischargescontainingeugenoldischargeandcoatingcharacterizations
AT cruznilsonc thinfilmdepositionbyatmosphericpressuredielectricbarrierdischargescontainingeugenoldischargeandcoatingcharacterizations