Covalent 2D‐Engineering of Graphene by Spatially Resolved Laser Writing/Reading/Erasing

We report a facile and efficient method for the covalent 2D‐patterning of monolayer graphene via laser irradiation. We utilized the photo‐cleavage of dibenzoylperoxide (DBPO) and optimized the subsequent radical additions to non‐activated graphene up to that level where controlled covalent 2D‐patter...

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Detalles Bibliográficos
Autores principales: Edelthalhammer, Konstantin Felix, Dasler, Daniela, Jurkiewicz, Lisa, Nagel, Tamara, Al‐Fogra, Sabrin, Hauke, Frank, Hirsch, Andreas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2020
Materias:
Research Articles
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7756404/
https://www.ncbi.nlm.nih.gov/pubmed/32808699
http://dx.doi.org/10.1002/anie.202006874
Descripción
Sumario:We report a facile and efficient method for the covalent 2D‐patterning of monolayer graphene via laser irradiation. We utilized the photo‐cleavage of dibenzoylperoxide (DBPO) and optimized the subsequent radical additions to non‐activated graphene up to that level where controlled covalent 2D‐patterning of graphene initiated by spatially resolved laser writing is possible. The covalent 2D‐functionalization of graphene, which is monitored by scanning Raman microscopy (SRM) is completely reversible. This new concept enables write/read/erase control over the covalent chemical information stored on the graphene surface.

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