Cargando…
Anomalous Properties of the Dislocation-Free Interface between Si(111) Substrate and 3C-SiC(111) Epitaxial Layer
Thin films of single-crystal silicon carbide of cubic polytype with a thickness of 40–100 nm, which were grown from the silicon substrate material by the method of coordinated substitution of atoms by a chemical reaction of silicon with carbon monoxide CO gas, have been studied by spectral ellipsome...
Autores principales: | Kukushkin, Sergey A., Osipov, Andrey V. |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2020
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7795334/ https://www.ncbi.nlm.nih.gov/pubmed/33375252 http://dx.doi.org/10.3390/ma14010078 |
Ejemplares similares
-
Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid–Gas Phase Epitaxy on Si (111)
por: Perova, TS, et al.
Publicado: (2010) -
Surface Chemistry Involved in Epitaxy of Graphene on 3C-SiC(111)/Si(111)
por: Abe, Shunsuke, et al.
Publicado: (2010) -
Growth Mechanism of Semipolar AlN Layers by HVPE on Hybrid SiC/Si(110) Substrates
por: Koryakin, Alexander A., et al.
Publicado: (2022) -
RF Sputtering, Post-Annealing Treatment and Characterizations of ZnO (002) Thin Films on 3C-SiC (111)/Si (111) Substrates
por: Valliyil Sasi, Visakh, et al.
Publicado: (2017) -
Kinetic surface roughening and wafer bow control in heteroepitaxial growth of 3C-SiC on Si(111) substrates
por: Wang, Li, et al.
Publicado: (2015)