Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties

Al(2)O(3) layers were deposited onto electrodes by atomic layer deposition. Solubility and electron-transport blocking were tested. Films deposited onto fluorine-doped tin oxide (FTO, F:SnO(2)/glass) substrates blocked electron transfer to redox couples (ferricyanide/ferrocyanide) in aqueous media....

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Autores principales: Krýsová, Hana, Neumann-Spallart, Michael, Tarábková, Hana, Janda, Pavel, Kavan, Ladislav, Krýsa, Josef
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2021
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7801786/
https://www.ncbi.nlm.nih.gov/pubmed/33489664
http://dx.doi.org/10.3762/bjnano.12.2
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author Krýsová, Hana
Neumann-Spallart, Michael
Tarábková, Hana
Janda, Pavel
Kavan, Ladislav
Krýsa, Josef
author_facet Krýsová, Hana
Neumann-Spallart, Michael
Tarábková, Hana
Janda, Pavel
Kavan, Ladislav
Krýsa, Josef
author_sort Krýsová, Hana
collection PubMed
description Al(2)O(3) layers were deposited onto electrodes by atomic layer deposition. Solubility and electron-transport blocking were tested. Films deposited onto fluorine-doped tin oxide (FTO, F:SnO(2)/glass) substrates blocked electron transfer to redox couples (ferricyanide/ferrocyanide) in aqueous media. However, these films were rapidly dissolved in 1 M NaOH (≈100 nm/h). The dissolution was slower in 1 M H(2)SO(4) (1 nm/h) but after 24 h the blocking behaviour was entirely lost. The optimal stability was reached at pH 7.2 where no changes were found up to 24 h and even after 168 h of exposure the changes in the blocking behaviour were still minimal. This behaviour was also observed for protection against direct reduction of FTO.
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spelling pubmed-78017862021-01-22 Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties Krýsová, Hana Neumann-Spallart, Michael Tarábková, Hana Janda, Pavel Kavan, Ladislav Krýsa, Josef Beilstein J Nanotechnol Full Research Paper Al(2)O(3) layers were deposited onto electrodes by atomic layer deposition. Solubility and electron-transport blocking were tested. Films deposited onto fluorine-doped tin oxide (FTO, F:SnO(2)/glass) substrates blocked electron transfer to redox couples (ferricyanide/ferrocyanide) in aqueous media. However, these films were rapidly dissolved in 1 M NaOH (≈100 nm/h). The dissolution was slower in 1 M H(2)SO(4) (1 nm/h) but after 24 h the blocking behaviour was entirely lost. The optimal stability was reached at pH 7.2 where no changes were found up to 24 h and even after 168 h of exposure the changes in the blocking behaviour were still minimal. This behaviour was also observed for protection against direct reduction of FTO. Beilstein-Institut 2021-01-05 /pmc/articles/PMC7801786/ /pubmed/33489664 http://dx.doi.org/10.3762/bjnano.12.2 Text en Copyright © 2021, Krýsová et al. https://creativecommons.org/licenses/by/4.0https://www.beilstein-journals.org/bjnano/terms/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0). Please note that the reuse, redistribution and reproduction in particular requires that the author(s) and source are credited and that individual graphics may be subject to special legal provisions. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms/terms)
spellingShingle Full Research Paper
Krýsová, Hana
Neumann-Spallart, Michael
Tarábková, Hana
Janda, Pavel
Kavan, Ladislav
Krýsa, Josef
Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
title Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
title_full Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
title_fullStr Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
title_full_unstemmed Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
title_short Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
title_sort atomic layer deposited films of al(2)o(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
topic Full Research Paper
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7801786/
https://www.ncbi.nlm.nih.gov/pubmed/33489664
http://dx.doi.org/10.3762/bjnano.12.2
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