Prominent luminescence of silicon-vacancy defects created in bulk silicon carbide p–n junction diodes

We investigate fluorescent defect centers in 4H silicon carbide p–n junction diodes fabricated via aluminum-ion implantation into an n-type bulk substrate without the use of an epitaxial growth process. At room temperature, electron-irradiated p–n junction diodes exhibit electroluminescence originating from silicon-vacancy defects. For a diode exposed to an electron dose of [Formula: see text] at [Formula: see text] , the electroluminescence intensity of these defects is most prominent within a wavelength range of 400–[Formula: see text] . The commonly observed [Formula: see text] emission was sufficiently suppressed in the electroluminescence spectra of all the fabricated diodes, while it was detected in the photoluminescence measurements. The photoluminescence spectra also displayed emission lines from silicon-vacancy defects.