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Toughening of a Soft Polar Polythiophene through Copolymerization with Hard Urethane Segments
Polar polythiophenes with oligoethylene glycol side chains are exceedingly soft materials. A low glass transition temperature and low degree of crystallinity prevents their use as a bulk material. The synthesis of a copolymer comprising 1) soft polythiophene blocks with tetraethylene glycol side cha...
Autores principales: | , , , , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
John Wiley and Sons Inc.
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7816697/ https://www.ncbi.nlm.nih.gov/pubmed/33511014 http://dx.doi.org/10.1002/advs.202002778 |
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author | Zokaei, Sepideh Kroon, Renee Gladisch, Johannes Paulsen, Bryan D. Sohn, Wonil Hofmann, Anna I. Persson, Gustav Stamm, Arne Syrén, Per‐Olof Olsson, Eva Rivnay, Jonathan Stavrinidou, Eleni Lund, Anja Müller, Christian |
author_facet | Zokaei, Sepideh Kroon, Renee Gladisch, Johannes Paulsen, Bryan D. Sohn, Wonil Hofmann, Anna I. Persson, Gustav Stamm, Arne Syrén, Per‐Olof Olsson, Eva Rivnay, Jonathan Stavrinidou, Eleni Lund, Anja Müller, Christian |
author_sort | Zokaei, Sepideh |
collection | PubMed |
description | Polar polythiophenes with oligoethylene glycol side chains are exceedingly soft materials. A low glass transition temperature and low degree of crystallinity prevents their use as a bulk material. The synthesis of a copolymer comprising 1) soft polythiophene blocks with tetraethylene glycol side chains, and 2) hard urethane segments is reported. The molecular design is contrary to that of other semiconductor‐insulator copolymers, which typically combine a soft nonconjugated spacer with hard conjugated segments. Copolymerization of polar polythiophenes and urethane segments results in a ductile material that can be used as a free‐standing solid. The copolymer displays a storage modulus of 25 MPa at room temperature, elongation at break of 95%, and a reduced degree of swelling due to hydrogen bonding. Both chemical doping and electrochemical oxidation reveal that the introduction of urethane segments does not unduly reduce the hole charge‐carrier mobility and ability to take up charge. Further, stable operation is observed when the copolymer is used as the active layer of organic electrochemical transistors. |
format | Online Article Text |
id | pubmed-7816697 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | John Wiley and Sons Inc. |
record_format | MEDLINE/PubMed |
spelling | pubmed-78166972021-01-27 Toughening of a Soft Polar Polythiophene through Copolymerization with Hard Urethane Segments Zokaei, Sepideh Kroon, Renee Gladisch, Johannes Paulsen, Bryan D. Sohn, Wonil Hofmann, Anna I. Persson, Gustav Stamm, Arne Syrén, Per‐Olof Olsson, Eva Rivnay, Jonathan Stavrinidou, Eleni Lund, Anja Müller, Christian Adv Sci (Weinh) Full Papers Polar polythiophenes with oligoethylene glycol side chains are exceedingly soft materials. A low glass transition temperature and low degree of crystallinity prevents their use as a bulk material. The synthesis of a copolymer comprising 1) soft polythiophene blocks with tetraethylene glycol side chains, and 2) hard urethane segments is reported. The molecular design is contrary to that of other semiconductor‐insulator copolymers, which typically combine a soft nonconjugated spacer with hard conjugated segments. Copolymerization of polar polythiophenes and urethane segments results in a ductile material that can be used as a free‐standing solid. The copolymer displays a storage modulus of 25 MPa at room temperature, elongation at break of 95%, and a reduced degree of swelling due to hydrogen bonding. Both chemical doping and electrochemical oxidation reveal that the introduction of urethane segments does not unduly reduce the hole charge‐carrier mobility and ability to take up charge. Further, stable operation is observed when the copolymer is used as the active layer of organic electrochemical transistors. John Wiley and Sons Inc. 2020-12-11 /pmc/articles/PMC7816697/ /pubmed/33511014 http://dx.doi.org/10.1002/advs.202002778 Text en © 2020 The Authors. Advanced Science published by Wiley‐VCH GmbH This is an open access article under the terms of the http://creativecommons.org/licenses/by/4.0/ License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited. |
spellingShingle | Full Papers Zokaei, Sepideh Kroon, Renee Gladisch, Johannes Paulsen, Bryan D. Sohn, Wonil Hofmann, Anna I. Persson, Gustav Stamm, Arne Syrén, Per‐Olof Olsson, Eva Rivnay, Jonathan Stavrinidou, Eleni Lund, Anja Müller, Christian Toughening of a Soft Polar Polythiophene through Copolymerization with Hard Urethane Segments |
title | Toughening of a Soft Polar Polythiophene through Copolymerization with Hard Urethane Segments |
title_full | Toughening of a Soft Polar Polythiophene through Copolymerization with Hard Urethane Segments |
title_fullStr | Toughening of a Soft Polar Polythiophene through Copolymerization with Hard Urethane Segments |
title_full_unstemmed | Toughening of a Soft Polar Polythiophene through Copolymerization with Hard Urethane Segments |
title_short | Toughening of a Soft Polar Polythiophene through Copolymerization with Hard Urethane Segments |
title_sort | toughening of a soft polar polythiophene through copolymerization with hard urethane segments |
topic | Full Papers |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7816697/ https://www.ncbi.nlm.nih.gov/pubmed/33511014 http://dx.doi.org/10.1002/advs.202002778 |
work_keys_str_mv | AT zokaeisepideh tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT kroonrenee tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT gladischjohannes tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT paulsenbryand tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT sohnwonil tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT hofmannannai tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT perssongustav tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT stammarne tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT syrenperolof tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT olssoneva tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT rivnayjonathan tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT stavrinidoueleni tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT lundanja tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments AT mullerchristian tougheningofasoftpolarpolythiophenethroughcopolymerizationwithhardurethanesegments |