TiO(2) Coatings Via Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition for Enhancing the UV-Resistant Properties of Transparent Plastics

[Image: see text] Herein, TiO(2) coatings were deposited on photodegradable polymers for protection from UV irradiation using the atmospheric-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) technique. Polymethylmethacrylate (PMMA) and polycarbonate (PC) substrates were coated with titanium tetraisopropoxide as the precursor in an open-air atmospheric-pressure nonequilibrium argon plasma jet. The AP-PECVD-derived TiO(2) coatings exhibited good adhesion to PMMA and PC. The TiO(2) coatings could shield more than 99% of UV light in the wavelength range of 200–300 nm, without affecting the transmittance of visible light. UV irradiation tests on polymer films demonstrated that the degradation rates of PMMA and PC were significantly reduced by one-tenth after they were coated with TiO(2) films.