Combined Focused Electron Beam-Induced Deposition and Etching for the Patterning of Dense Lines without Interconnecting Material

High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the lines as a result of the Gaussian line profile...

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Detalles Bibliográficos
Autores principales: Hari, Sangeetha, Trompenaars, P. H. F., Mulders, J. J. L., Kruit, Pieter, Hagen, C. W.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7824246/
https://www.ncbi.nlm.nih.gov/pubmed/33374159
http://dx.doi.org/10.3390/mi12010008

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7824246/
https://www.ncbi.nlm.nih.gov/pubmed/33374159
http://dx.doi.org/10.3390/mi12010008

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