Analysis of perovskite oxide etching using argon inductively coupled plasmas for photonics applications

We analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niobate (LN). The measured results are predictable and repeatab...

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Detalles Bibliográficos
Autores principales: Chen, Guanyu, Cheung, Eric Jun Hao, Cao, Yu, Pan, Jisheng, Danner, Aaron J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2021
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7876212/
https://www.ncbi.nlm.nih.gov/pubmed/33569658
http://dx.doi.org/10.1186/s11671-021-03494-2

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7876212/
https://www.ncbi.nlm.nih.gov/pubmed/33569658
http://dx.doi.org/10.1186/s11671-021-03494-2

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