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Analysis of perovskite oxide etching using argon inductively coupled plasmas for photonics applications
We analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niobate (LN). The measured results are predictable and repeatab...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer US
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7876212/ https://www.ncbi.nlm.nih.gov/pubmed/33569658 http://dx.doi.org/10.1186/s11671-021-03494-2 |