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Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide

Till now electron microscopy techniques have not been used to evaluate the plasma–target interactions undergone during the magnetron sputtering process. The destructive nature of this interaction severely alters the target microstructure. Utilising quantitative microscopy techniques can shed light o...

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Autores principales: JAHANGIRI, ALI REZA, RAJABI KALVANI, PAYAM, SHAPOURI, SAMANEH, SARI, AMIRHOSSEIN, ŢĂLU, ŞTEFAN, JALILI, YOUSEF SEYED
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7891359/
https://www.ncbi.nlm.nih.gov/pubmed/32926411
http://dx.doi.org/10.1111/jmi.12961
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author JAHANGIRI, ALI REZA
RAJABI KALVANI, PAYAM
SHAPOURI, SAMANEH
SARI, AMIRHOSSEIN
ŢĂLU, ŞTEFAN
JALILI, YOUSEF SEYED
author_facet JAHANGIRI, ALI REZA
RAJABI KALVANI, PAYAM
SHAPOURI, SAMANEH
SARI, AMIRHOSSEIN
ŢĂLU, ŞTEFAN
JALILI, YOUSEF SEYED
author_sort JAHANGIRI, ALI REZA
collection PubMed
description Till now electron microscopy techniques have not been used to evaluate the plasma–target interactions undergone during the magnetron sputtering process. The destructive nature of this interaction severely alters the target microstructure. Utilising quantitative microscopy techniques can shed light on the complex plasma and solid‐state processes involved which can ultimately lead to improved functional thin film deposition. As a representative functional material, aluminium‐doped‐zinc oxide (AZO) is an upcoming alternative to conventional transparent electrode wherein the process optimisation is of great importance. In this paper, we evaluate the pre‐ and post‐sputter field emission scanning electron microscopy (FESEM) data for ceramic AZO target fabricated at three final sintering temperatures (1100°C, 1200°C and 1300°C). In all cases, grain boundaries are merged in addition to a visible reduction in the secondary phases which makes segmentation‐based image analysis challenging. Through surface statistics (i.e. fractal dimension, autocorrelation length, texture aspect ratio and entropy) as a function of magnification we can quantify the electron microscopy image of the microstructure. We show that the plasma–microstructure interaction leads to an increase in autocorrelation length, texture aspect ratio and entropy for the optimum AZO ceramic sputtering target sintered at 1200°C. Furthermore, a maximum reduction in fractal dimension span (as determined by exponential regression) is also observed for 1200°C. In addition to the evaluation of plasma effects on sintering, our approach can provide a window towards understanding the underlying thin film growth mechanisms. We believe that this technique can be applied to the defect characterisation of a wide range of polycrystalline ceramic sputtering targets (e.g. ITO, CZTS, GAZO and so on) with the ultimate goal of improving the magnetron sputtering process and the resulting functional thin film. LAY DESCRIPTION: : ○. https://www.youtube.com/watch?v=cmBljeC79Ls. : ○. https://www.youtube.com/watch?v=Cyu7etM-0Ko. : ○. https://www.youtube.com/watch?v=9OEz_e9C4KM. : ○. https://www.youtube.com/watch?v=kTLaTJfNX3c. : ○. https://www.youtube.com/watch?v=VdjYVF4a6iU.
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spelling pubmed-78913592021-03-02 Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide JAHANGIRI, ALI REZA RAJABI KALVANI, PAYAM SHAPOURI, SAMANEH SARI, AMIRHOSSEIN ŢĂLU, ŞTEFAN JALILI, YOUSEF SEYED J Microsc Original Articles Till now electron microscopy techniques have not been used to evaluate the plasma–target interactions undergone during the magnetron sputtering process. The destructive nature of this interaction severely alters the target microstructure. Utilising quantitative microscopy techniques can shed light on the complex plasma and solid‐state processes involved which can ultimately lead to improved functional thin film deposition. As a representative functional material, aluminium‐doped‐zinc oxide (AZO) is an upcoming alternative to conventional transparent electrode wherein the process optimisation is of great importance. In this paper, we evaluate the pre‐ and post‐sputter field emission scanning electron microscopy (FESEM) data for ceramic AZO target fabricated at three final sintering temperatures (1100°C, 1200°C and 1300°C). In all cases, grain boundaries are merged in addition to a visible reduction in the secondary phases which makes segmentation‐based image analysis challenging. Through surface statistics (i.e. fractal dimension, autocorrelation length, texture aspect ratio and entropy) as a function of magnification we can quantify the electron microscopy image of the microstructure. We show that the plasma–microstructure interaction leads to an increase in autocorrelation length, texture aspect ratio and entropy for the optimum AZO ceramic sputtering target sintered at 1200°C. Furthermore, a maximum reduction in fractal dimension span (as determined by exponential regression) is also observed for 1200°C. In addition to the evaluation of plasma effects on sintering, our approach can provide a window towards understanding the underlying thin film growth mechanisms. We believe that this technique can be applied to the defect characterisation of a wide range of polycrystalline ceramic sputtering targets (e.g. ITO, CZTS, GAZO and so on) with the ultimate goal of improving the magnetron sputtering process and the resulting functional thin film. LAY DESCRIPTION: : ○. https://www.youtube.com/watch?v=cmBljeC79Ls. : ○. https://www.youtube.com/watch?v=Cyu7etM-0Ko. : ○. https://www.youtube.com/watch?v=9OEz_e9C4KM. : ○. https://www.youtube.com/watch?v=kTLaTJfNX3c. : ○. https://www.youtube.com/watch?v=VdjYVF4a6iU. John Wiley and Sons Inc. 2020-09-28 2021-03 /pmc/articles/PMC7891359/ /pubmed/32926411 http://dx.doi.org/10.1111/jmi.12961 Text en © 2020 The Authors. Journal of Microscopy published by John Wiley & Sons Ltd on behalf of Royal Microscopical Society This is an open access article under the terms of the http://creativecommons.org/licenses/by-nc/4.0/ License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited and is not used for commercial purposes.
spellingShingle Original Articles
JAHANGIRI, ALI REZA
RAJABI KALVANI, PAYAM
SHAPOURI, SAMANEH
SARI, AMIRHOSSEIN
ŢĂLU, ŞTEFAN
JALILI, YOUSEF SEYED
Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide
title Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide
title_full Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide
title_fullStr Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide
title_full_unstemmed Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide
title_short Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide
title_sort quantitative sem characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide
topic Original Articles
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7891359/
https://www.ncbi.nlm.nih.gov/pubmed/32926411
http://dx.doi.org/10.1111/jmi.12961
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