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Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography
| Autores principales: | , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7900103/ https://www.ncbi.nlm.nih.gov/pubmed/33619319 http://dx.doi.org/10.1038/s41598-021-84101-3 |
| _version_ | 1783654151407796224 |
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| author | Kazemi, Alireza He, Xiang Alaie, Seyedhamidreza Ghasemi, Javad Dawson, Noel Mayur Cavallo, Francesca Habteyes, Terefe G. Brueck, Steven R. J. Krishna, Sanjay |
| author_facet | Kazemi, Alireza He, Xiang Alaie, Seyedhamidreza Ghasemi, Javad Dawson, Noel Mayur Cavallo, Francesca Habteyes, Terefe G. Brueck, Steven R. J. Krishna, Sanjay |
| author_sort | Kazemi, Alireza |
| collection | PubMed |
| description | |
| format | Online Article Text |
| id | pubmed-7900103 |
| institution | National Center for Biotechnology Information |
| language | English |
| publishDate | 2021 |
| publisher | Nature Publishing Group UK |
| record_format | MEDLINE/PubMed |
| spelling | pubmed-79001032021-02-24 Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography Kazemi, Alireza He, Xiang Alaie, Seyedhamidreza Ghasemi, Javad Dawson, Noel Mayur Cavallo, Francesca Habteyes, Terefe G. Brueck, Steven R. J. Krishna, Sanjay Sci Rep Retraction Note Nature Publishing Group UK 2021-02-22 /pmc/articles/PMC7900103/ /pubmed/33619319 http://dx.doi.org/10.1038/s41598-021-84101-3 Text en © The Publisher 2021 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/. |
| spellingShingle | Retraction Note Kazemi, Alireza He, Xiang Alaie, Seyedhamidreza Ghasemi, Javad Dawson, Noel Mayur Cavallo, Francesca Habteyes, Terefe G. Brueck, Steven R. J. Krishna, Sanjay Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography |
| title | Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography |
| title_full | Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography |
| title_fullStr | Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography |
| title_full_unstemmed | Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography |
| title_short | Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography |
| title_sort | retraction note: large-area semiconducting graphene nanomesh tailored by interferometric lithography |
| topic | Retraction Note |
| url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7900103/ https://www.ncbi.nlm.nih.gov/pubmed/33619319 http://dx.doi.org/10.1038/s41598-021-84101-3 |
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