Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Detalles Bibliográficos
Autores principales: Kazemi, Alireza, He, Xiang, Alaie, Seyedhamidreza, Ghasemi, Javad, Dawson, Noel Mayur, Cavallo, Francesca, Habteyes, Terefe G., Brueck, Steven R. J., Krishna, Sanjay
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2021
Materias:
Retraction Note
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7900103/
https://www.ncbi.nlm.nih.gov/pubmed/33619319
http://dx.doi.org/10.1038/s41598-021-84101-3

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7900103/
https://www.ncbi.nlm.nih.gov/pubmed/33619319
http://dx.doi.org/10.1038/s41598-021-84101-3

Ejemplares similares