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Mechanistic study of the gas-phase chemistry during the spray deposition of Zn(O,S) films by mass spectrometry

The mass spectrometer, is a powerful tool to identify species and investigate reactions in the gas phase. In this work, the mechanism of aerosol assisted chemical vapor deposition (AACVD) of Zn(O,S) films prepared from H(2)S and zinc acetylacetonate (Zn(acac)(2)) precursor solutions is elucidated by...

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Autores principales: Fu, Yanpeng, Gledhill, Sophie, Fischer, Christian-Herbert
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7910520/
https://www.ncbi.nlm.nih.gov/pubmed/33639531
http://dx.doi.org/10.1016/j.ultsonch.2021.105492
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author Fu, Yanpeng
Gledhill, Sophie
Fischer, Christian-Herbert
author_facet Fu, Yanpeng
Gledhill, Sophie
Fischer, Christian-Herbert
author_sort Fu, Yanpeng
collection PubMed
description The mass spectrometer, is a powerful tool to identify species and investigate reactions in the gas phase. In this work, the mechanism of aerosol assisted chemical vapor deposition (AACVD) of Zn(O,S) films prepared from H(2)S and zinc acetylacetonate (Zn(acac)(2)) precursor solutions is elucidated by mass spectrometry. The thermochemical behavior of Zn(acac)(2) is investigated by characterizing the influence of the solvent (H(2)O or ethanol), the pH value of the precursor solution and the effect of the reactant H(2)S, and by tracking gaseous intermediate products using mass spectrometry. Based on these results, a proton-promoted thermolysis mechanism for the AACVD Zn(O,S) film formation is then proposed, which is initiated by the hydrolysis with H(2)O as the first stage, followed either by the rearrangement with an intramolecular proton or by the reaction with an extramolecular proton to produce ZnO or Zn(O,S). A real time mass tracking of the AACVD process reveals that only an adequate amount of H(2)S promotes the chemical gas-phase decomposition and sulfurization process, while an excess of H(2)S depletes the gaseous Zn(acac)(2) concentration and consequently reduces the film growth rate. The knowledge of the thermal decomposition process helps to optimize synthesis conditions and to adjust film properties to meet the requirement of the application in chalcopyrite or kesterite thin film solar cells.
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spelling pubmed-79105202021-03-04 Mechanistic study of the gas-phase chemistry during the spray deposition of Zn(O,S) films by mass spectrometry Fu, Yanpeng Gledhill, Sophie Fischer, Christian-Herbert Ultrason Sonochem Original Research Article The mass spectrometer, is a powerful tool to identify species and investigate reactions in the gas phase. In this work, the mechanism of aerosol assisted chemical vapor deposition (AACVD) of Zn(O,S) films prepared from H(2)S and zinc acetylacetonate (Zn(acac)(2)) precursor solutions is elucidated by mass spectrometry. The thermochemical behavior of Zn(acac)(2) is investigated by characterizing the influence of the solvent (H(2)O or ethanol), the pH value of the precursor solution and the effect of the reactant H(2)S, and by tracking gaseous intermediate products using mass spectrometry. Based on these results, a proton-promoted thermolysis mechanism for the AACVD Zn(O,S) film formation is then proposed, which is initiated by the hydrolysis with H(2)O as the first stage, followed either by the rearrangement with an intramolecular proton or by the reaction with an extramolecular proton to produce ZnO or Zn(O,S). A real time mass tracking of the AACVD process reveals that only an adequate amount of H(2)S promotes the chemical gas-phase decomposition and sulfurization process, while an excess of H(2)S depletes the gaseous Zn(acac)(2) concentration and consequently reduces the film growth rate. The knowledge of the thermal decomposition process helps to optimize synthesis conditions and to adjust film properties to meet the requirement of the application in chalcopyrite or kesterite thin film solar cells. Elsevier 2021-02-10 /pmc/articles/PMC7910520/ /pubmed/33639531 http://dx.doi.org/10.1016/j.ultsonch.2021.105492 Text en © 2021 The Authors http://creativecommons.org/licenses/by-nc-nd/4.0/ This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).
spellingShingle Original Research Article
Fu, Yanpeng
Gledhill, Sophie
Fischer, Christian-Herbert
Mechanistic study of the gas-phase chemistry during the spray deposition of Zn(O,S) films by mass spectrometry
title Mechanistic study of the gas-phase chemistry during the spray deposition of Zn(O,S) films by mass spectrometry
title_full Mechanistic study of the gas-phase chemistry during the spray deposition of Zn(O,S) films by mass spectrometry
title_fullStr Mechanistic study of the gas-phase chemistry during the spray deposition of Zn(O,S) films by mass spectrometry
title_full_unstemmed Mechanistic study of the gas-phase chemistry during the spray deposition of Zn(O,S) films by mass spectrometry
title_short Mechanistic study of the gas-phase chemistry during the spray deposition of Zn(O,S) films by mass spectrometry
title_sort mechanistic study of the gas-phase chemistry during the spray deposition of zn(o,s) films by mass spectrometry
topic Original Research Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7910520/
https://www.ncbi.nlm.nih.gov/pubmed/33639531
http://dx.doi.org/10.1016/j.ultsonch.2021.105492
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