Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells

Plasma-enhanced atomic layer deposition (PEALD) of TiN thin films were investigated as an effective Se diffusion barrier layer for Cu (In, Ga) Se(2) (CIGS) solar cells. Before the deposition of TiN thin film on CIGS solar cells, a saturated growth rate of 0.67 Å/cycle was confirmed using tetrakis(di...

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Detalles Bibliográficos
Autores principales: Woo, Hyun-Jae, Lee, Woo-Jae, Koh, Eun-Kyong, Jang, Seung Il, Kim, Shinho, Moon, Hyoungseok, Kwon, Se-Hun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7912980/
https://www.ncbi.nlm.nih.gov/pubmed/33540729
http://dx.doi.org/10.3390/nano11020370

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7912980/
https://www.ncbi.nlm.nih.gov/pubmed/33540729
http://dx.doi.org/10.3390/nano11020370

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