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A RF Redundant TSV Interconnection for High Resistance Si Interposer
Through Silicon Via (TSV) technology is capable meeting effective, compact, high density, high integration, and high-performance requirements. In high-frequency applications, with the rapid development of 5G and millimeter-wave radar, the TSV interposer will become a competitive choice for radio fre...
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7914721/ https://www.ncbi.nlm.nih.gov/pubmed/33567782 http://dx.doi.org/10.3390/mi12020169 |
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author | Wang, Mengcheng Ma, Shenglin Jin, Yufeng Wang, Wei Chen, Jing Hu, Liulin He, Shuwei |
author_facet | Wang, Mengcheng Ma, Shenglin Jin, Yufeng Wang, Wei Chen, Jing Hu, Liulin He, Shuwei |
author_sort | Wang, Mengcheng |
collection | PubMed |
description | Through Silicon Via (TSV) technology is capable meeting effective, compact, high density, high integration, and high-performance requirements. In high-frequency applications, with the rapid development of 5G and millimeter-wave radar, the TSV interposer will become a competitive choice for radio frequency system-in-package (RF SIP) substrates. This paper presents a redundant TSV interconnect design for high resistivity Si interposers for millimeter-wave applications. To verify its feasibility, a set of test structures capable of working at millimeter waves are designed, which are composed of three pieces of CPW (coplanar waveguide) lines connected by single TSV, dual redundant TSV, and quad redundant TSV interconnects. First, HFSS software is used for modeling and simulation, then, a modified equivalent circuit model is established to analysis the effect of the redundant TSVs on the high-frequency transmission performance to solidify the HFSS based simulation. At the same time, a failure simulation was carried out and results prove that redundant TSV can still work normally at 44 GHz frequency when failure occurs. Using the developed TSV process, the sample is then fabricated and tested. Using L-2L de-embedding method to extract S-parameters of the TSV interconnection. The insertion loss of dual and quad redundant TSVs are 0.19 dB and 0.46 dB at 40 GHz, respectively. |
format | Online Article Text |
id | pubmed-7914721 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-79147212021-03-01 A RF Redundant TSV Interconnection for High Resistance Si Interposer Wang, Mengcheng Ma, Shenglin Jin, Yufeng Wang, Wei Chen, Jing Hu, Liulin He, Shuwei Micromachines (Basel) Article Through Silicon Via (TSV) technology is capable meeting effective, compact, high density, high integration, and high-performance requirements. In high-frequency applications, with the rapid development of 5G and millimeter-wave radar, the TSV interposer will become a competitive choice for radio frequency system-in-package (RF SIP) substrates. This paper presents a redundant TSV interconnect design for high resistivity Si interposers for millimeter-wave applications. To verify its feasibility, a set of test structures capable of working at millimeter waves are designed, which are composed of three pieces of CPW (coplanar waveguide) lines connected by single TSV, dual redundant TSV, and quad redundant TSV interconnects. First, HFSS software is used for modeling and simulation, then, a modified equivalent circuit model is established to analysis the effect of the redundant TSVs on the high-frequency transmission performance to solidify the HFSS based simulation. At the same time, a failure simulation was carried out and results prove that redundant TSV can still work normally at 44 GHz frequency when failure occurs. Using the developed TSV process, the sample is then fabricated and tested. Using L-2L de-embedding method to extract S-parameters of the TSV interconnection. The insertion loss of dual and quad redundant TSVs are 0.19 dB and 0.46 dB at 40 GHz, respectively. MDPI 2021-02-08 /pmc/articles/PMC7914721/ /pubmed/33567782 http://dx.doi.org/10.3390/mi12020169 Text en © 2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Wang, Mengcheng Ma, Shenglin Jin, Yufeng Wang, Wei Chen, Jing Hu, Liulin He, Shuwei A RF Redundant TSV Interconnection for High Resistance Si Interposer |
title | A RF Redundant TSV Interconnection for High Resistance Si Interposer |
title_full | A RF Redundant TSV Interconnection for High Resistance Si Interposer |
title_fullStr | A RF Redundant TSV Interconnection for High Resistance Si Interposer |
title_full_unstemmed | A RF Redundant TSV Interconnection for High Resistance Si Interposer |
title_short | A RF Redundant TSV Interconnection for High Resistance Si Interposer |
title_sort | rf redundant tsv interconnection for high resistance si interposer |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7914721/ https://www.ncbi.nlm.nih.gov/pubmed/33567782 http://dx.doi.org/10.3390/mi12020169 |
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