Cargando…

A RF Redundant TSV Interconnection for High Resistance Si Interposer

Through Silicon Via (TSV) technology is capable meeting effective, compact, high density, high integration, and high-performance requirements. In high-frequency applications, with the rapid development of 5G and millimeter-wave radar, the TSV interposer will become a competitive choice for radio fre...

Descripción completa

Detalles Bibliográficos
Autores principales: Wang, Mengcheng, Ma, Shenglin, Jin, Yufeng, Wang, Wei, Chen, Jing, Hu, Liulin, He, Shuwei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7914721/
https://www.ncbi.nlm.nih.gov/pubmed/33567782
http://dx.doi.org/10.3390/mi12020169
_version_ 1783657069777256448
author Wang, Mengcheng
Ma, Shenglin
Jin, Yufeng
Wang, Wei
Chen, Jing
Hu, Liulin
He, Shuwei
author_facet Wang, Mengcheng
Ma, Shenglin
Jin, Yufeng
Wang, Wei
Chen, Jing
Hu, Liulin
He, Shuwei
author_sort Wang, Mengcheng
collection PubMed
description Through Silicon Via (TSV) technology is capable meeting effective, compact, high density, high integration, and high-performance requirements. In high-frequency applications, with the rapid development of 5G and millimeter-wave radar, the TSV interposer will become a competitive choice for radio frequency system-in-package (RF SIP) substrates. This paper presents a redundant TSV interconnect design for high resistivity Si interposers for millimeter-wave applications. To verify its feasibility, a set of test structures capable of working at millimeter waves are designed, which are composed of three pieces of CPW (coplanar waveguide) lines connected by single TSV, dual redundant TSV, and quad redundant TSV interconnects. First, HFSS software is used for modeling and simulation, then, a modified equivalent circuit model is established to analysis the effect of the redundant TSVs on the high-frequency transmission performance to solidify the HFSS based simulation. At the same time, a failure simulation was carried out and results prove that redundant TSV can still work normally at 44 GHz frequency when failure occurs. Using the developed TSV process, the sample is then fabricated and tested. Using L-2L de-embedding method to extract S-parameters of the TSV interconnection. The insertion loss of dual and quad redundant TSVs are 0.19 dB and 0.46 dB at 40 GHz, respectively.
format Online
Article
Text
id pubmed-7914721
institution National Center for Biotechnology Information
language English
publishDate 2021
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-79147212021-03-01 A RF Redundant TSV Interconnection for High Resistance Si Interposer Wang, Mengcheng Ma, Shenglin Jin, Yufeng Wang, Wei Chen, Jing Hu, Liulin He, Shuwei Micromachines (Basel) Article Through Silicon Via (TSV) technology is capable meeting effective, compact, high density, high integration, and high-performance requirements. In high-frequency applications, with the rapid development of 5G and millimeter-wave radar, the TSV interposer will become a competitive choice for radio frequency system-in-package (RF SIP) substrates. This paper presents a redundant TSV interconnect design for high resistivity Si interposers for millimeter-wave applications. To verify its feasibility, a set of test structures capable of working at millimeter waves are designed, which are composed of three pieces of CPW (coplanar waveguide) lines connected by single TSV, dual redundant TSV, and quad redundant TSV interconnects. First, HFSS software is used for modeling and simulation, then, a modified equivalent circuit model is established to analysis the effect of the redundant TSVs on the high-frequency transmission performance to solidify the HFSS based simulation. At the same time, a failure simulation was carried out and results prove that redundant TSV can still work normally at 44 GHz frequency when failure occurs. Using the developed TSV process, the sample is then fabricated and tested. Using L-2L de-embedding method to extract S-parameters of the TSV interconnection. The insertion loss of dual and quad redundant TSVs are 0.19 dB and 0.46 dB at 40 GHz, respectively. MDPI 2021-02-08 /pmc/articles/PMC7914721/ /pubmed/33567782 http://dx.doi.org/10.3390/mi12020169 Text en © 2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Wang, Mengcheng
Ma, Shenglin
Jin, Yufeng
Wang, Wei
Chen, Jing
Hu, Liulin
He, Shuwei
A RF Redundant TSV Interconnection for High Resistance Si Interposer
title A RF Redundant TSV Interconnection for High Resistance Si Interposer
title_full A RF Redundant TSV Interconnection for High Resistance Si Interposer
title_fullStr A RF Redundant TSV Interconnection for High Resistance Si Interposer
title_full_unstemmed A RF Redundant TSV Interconnection for High Resistance Si Interposer
title_short A RF Redundant TSV Interconnection for High Resistance Si Interposer
title_sort rf redundant tsv interconnection for high resistance si interposer
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7914721/
https://www.ncbi.nlm.nih.gov/pubmed/33567782
http://dx.doi.org/10.3390/mi12020169
work_keys_str_mv AT wangmengcheng arfredundanttsvinterconnectionforhighresistancesiinterposer
AT mashenglin arfredundanttsvinterconnectionforhighresistancesiinterposer
AT jinyufeng arfredundanttsvinterconnectionforhighresistancesiinterposer
AT wangwei arfredundanttsvinterconnectionforhighresistancesiinterposer
AT chenjing arfredundanttsvinterconnectionforhighresistancesiinterposer
AT huliulin arfredundanttsvinterconnectionforhighresistancesiinterposer
AT heshuwei arfredundanttsvinterconnectionforhighresistancesiinterposer
AT wangmengcheng rfredundanttsvinterconnectionforhighresistancesiinterposer
AT mashenglin rfredundanttsvinterconnectionforhighresistancesiinterposer
AT jinyufeng rfredundanttsvinterconnectionforhighresistancesiinterposer
AT wangwei rfredundanttsvinterconnectionforhighresistancesiinterposer
AT chenjing rfredundanttsvinterconnectionforhighresistancesiinterposer
AT huliulin rfredundanttsvinterconnectionforhighresistancesiinterposer
AT heshuwei rfredundanttsvinterconnectionforhighresistancesiinterposer