Interactive association of maternal education and peer relationship with oppositional defiant disorder: an observational study

BACKGROUND: The objectives of this research were to gain insights on the interactive effects, by measuring familial and peer-related risk factors in youths with oppositional defiant disorder (ODD). METHODS: Participants were college students recruited nationwide, with age between 18 and 25. Through the consensus of expert meetings, a set of questionnaires were used to evaluate the familial status, participant’s peer group conditions, high-risk environment of illicit substance use, and oppositional symptoms. The logistic regression was performed to see the independent and interactive risk factors for ODD. RESULTS: A total of 981 subjects were enrolled. Six variables significantly associated with ODD at the multivariate logistic regression, including male, night division, poor academic performance, high risk environment, peer with illicit substance use and high maternal education level. High maternal education exerted independent protective effect on the development of ODD (adjusted odds ratio, aOR = 0.65, 95% CI = 0.44–0.99). Peer with illicit substance use was more likely to associate with ODD in the low maternal education group. The 2-way interactive effect of maternal education and peer with substance use on the development of ODD was OR = 4.96 (2.96, 8.31). CONCLUSION: The present study highlights the influence of maternal education level to ODD and its interaction with peer of illicit substance use. Our findings imply that the familial attachment and peer interaction are essential stages for the development of human behavior. TRIAL REGISTRATION: The research protocol was reviewed and approved by the ethical review committee of National Taiwan University Hospital (number 201505057RINC) and registered at clinical trial systems at National Taiwan University. In addition, subjects’ information was anonymous and de-identified prior to any analysis. SUPPLEMENTARY INFORMATION: The online version contains supplementary material available at 10.1186/s12888-021-03157-7.